Process–Performance Mapping of Aerosol Jet Printed Silver Traces: From Thermal Curing Parameters to RF Characteristics of Microstrip Devices

Abstract This paper presents a systematic methodology for quantifying the relationship between thermal curing parameters and radio-frequency performance in aerosol jet printed conductive traces on FR-4 substrates. Using microstrip transmission lines as diagnostic vehicles, we establish a multilevel correlation between thermal curing conditions, silver trace morphology and electrical properties, transmission-line RF characteristics, and antenna performance. Under selected practical curing conditions, the DC resistance of the printed silver traces decreased from 11.2 Ω for the low-temperature curing condition to 4.6 Ω for the high-temperature curing condition, indicating enhanced silver densification with increased thermal input. However, excessive thermal exposure may compromise FR-4 substrate reliability, suggesting that the optimal fabrication window requires a balance between conductor conductivity and substrate thermal stability. The transmission-line characterization further reveals that thermal curing conditions significantly influence impedance behavior and signal transmission characteristics, providing intermediate RF-level information for predicting antenna responses. These material-level signatures are correlated with the performance of inset-fed microstrip patch antennas fabricated under representative process conditions, demonstrating the effectiveness of the diagnostic transmission-line approach. The established process window is further evaluated through fabrication of a 4.8 GHz 2×1 patch array, demonstrating the applicability of the process–performance characterization approach to a higher-frequency and structurally more complex RF device.

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Publication Details

Journal
Engineering Research Express
Published
2026-11-11
DOI
https://doi.org/10.1088/2631-8695/aec104
Primary Topic
Nanomaterials and Printing Technologies
Type
article
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article

Process–Performance Mapping of Aerosol Jet Printed Silver Traces: From Thermal Curing Parameters to RF Characteristics of Microstrip Devices

Shuangjie Liu, Hui Zhang, Ke Li, Yifei Liu et al.
Engineering Research Express
Nanomaterials and Printing Technologies
article

Process–Performance Mapping of Aerosol Jet Printed Silver Traces: From Thermal Curing Parameters to RF Characteristics of Microstrip Devices

Shuangjie Liu, Hui Zhang, Ke Li, Yifei Liu, Li Jian Cheng, Xudong Liu
article en

Abstract

Abstract This paper presents a systematic methodology for quantifying the relationship between thermal curing parameters and radio-frequency performance in aerosol jet printed conductive traces on FR-4 substrates. Using microstrip transmission lines as diagnostic vehicles, we establish a multilevel correlation between thermal curing conditions, silver trace morphology and electrical properties, transmission-line RF characteristics, and antenna performance. Under selected practical curing conditions, the DC resistance of the printed silver traces decreased from 11.2 Ω for the low-temperature curing condition to 4.6 Ω for the high-temperature curing condition, indicating enhanced silver densification with increased thermal input. However, excessive thermal exposure may compromise FR-4 substrate reliability, suggesting that the optimal fabrication window requires a balance between conductor conductivity and substrate thermal stability. The transmission-line characterization further reveals that thermal curing conditions significantly influence impedance behavior and signal transmission characteristics, providing intermediate RF-level information for predicting antenna responses. These material-level signatures are correlated with the performance of inset-fed microstrip patch antennas fabricated under representative process conditions, demonstrating the effectiveness of the diagnostic transmission-line approach. The established process window is further evaluated through fabrication of a 4.8 GHz 2×1 patch array, demonstrating the applicability of the process–performance characterization approach to a higher-frequency and structurally more complex RF device.

Engineering Research Express
Shenyang Ligong University (CN)
Nanomaterials and Printing Technologies
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