Low-power 2D CFETs using single-crystal high-κ dielectrics

Abstract Aggressive scaling in silicon electronics—although essential for improving power, performance, area and cost—faces increasing challenges in further reducing power consumption due to electrostatic and leakage constraints 1,2 . Achieving efficient operation at low supply voltages therefore requires new materials and gate-stack engineering strategies. Two-dimensional (2D) semiconductors offer intrinsic advantages because their atomic thickness affords excellent gate control, and their sizable bandgaps suppress off-state current. However, a major obstacle is the imperfect interface between 2D channels and gate dielectrics, which degrades subthreshold swing, hysteresis and bias-temperature instability 3 . Here we demonstrate that a wafer-scale, transferable, single-crystal anatase titanium dioxide dielectric can be van der Waals integrated with 2D transition metal dichalcogenides. The obtained pristine 2D-dielectric interface enables subthreshold swing close to the thermal limit, record-low hysteresis and well-matched transfer characteristics for both n- and p-type enhancement-mode field-effect transistors. Building on this, we demonstrate complementary field-effect transistors, whose inverters achieve high voltage gain and large noise margins with subpicowatt static power consumption. These results highlight the promise of 2D semiconductors for ultra-low-power operation.

Authors

Publication Details

Journal
Nature
Published
2026-11-11
DOI
https://doi.org/10.1038/s41586-026-11272-2
Primary Topic
2D Materials and Applications
Type
article
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article

Low-power 2D CFETs using single-crystal high-κ dielectrics

Ni Yang, Zeheng Wang, Ang Kah-Wee, Dong‐Keun Ki et al.
Nature
2D Materials and Applications
article

Low-power 2D CFETs using single-crystal high-κ dielectrics

Ni Yang, Zeheng Wang, Ang Kah-Wee, Dong‐Keun Ki, Ji Zhang, Yi Wan, Chengdong Yao, Iuliana P. Radu, Sean Li, Fangyuan Zheng, Ang‐Sheng Chou, Lain‐Jong Li, Wanqing Meng, Yu-Cheng Lu, Zi‐Liang Yang, Vita Pi‐Ho Hu, Yee Sin Ang, Ya‐Ping Chiu, Ming‐Yang Li, Jing‐Kai Huang, Lingqi Li, Lin-Yun Huang, Geng-Chiau Liang, Wanying Li, Chao-Ching Cheng, Pengfei Yang, Yu-Ming Chang, Zongmeng Yang, Chenyang Li, Haomin Liu
article en

Abstract

Abstract Aggressive scaling in silicon electronics—although essential for improving power, performance, area and cost—faces increasing challenges in further reducing power consumption due to electrostatic and leakage constraints 1,2 . Achieving efficient operation at low supply voltages therefore requires new materials and gate-stack engineering strategies. Two-dimensional (2D) semiconductors offer intrinsic advantages because their atomic thickness affords excellent gate control, and their sizable bandgaps suppress off-state current. However, a major obstacle is the imperfect interface between 2D channels and gate dielectrics, which degrades subthreshold swing, hysteresis and bias-temperature instability 3 . Here we demonstrate that a wafer-scale, transferable, single-crystal anatase titanium dioxide dielectric can be van der Waals integrated with 2D transition metal dichalcogenides. The obtained pristine 2D-dielectric interface enables subthreshold swing close to the thermal limit, record-low hysteresis and well-matched transfer characteristics for both n- and p-type enhancement-mode field-effect transistors. Building on this, we demonstrate complementary field-effect transistors, whose inverters achieve high voltage gain and large noise margins with subpicowatt static power consumption. These results highlight the promise of 2D semiconductors for ultra-low-power operation.

Nature
2D Materials and Applications
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