Controlled Deposition Preparation of Low-Dimensional Nanomaterials and Their Applications in Optoelectronic Devices

Owing to the quantum confinement effect induced by dimensional confinement, significantly enhanced light-matter interaction, and excellent carrier transport properties, low-dimensional nanomaterials exhibit tremendous application potential in the field of next-generation optoelectronic devices. As a key link enabling the transition of low-dimensional nanomaterials from laboratory research to device applications, controlled deposition preparation techniques directly determine the morphology, layer count, crystal orientation, and defect density of materials, thereby profoundly affecting the optoelectronic performance and reliability of devices. This paper systematically reviews the main controlled deposition preparation techniques for low-dimensional nanomaterials, including the fundamental principles and research progress of chemical vapor deposition, physical vapor deposition, molecular beam epitaxy, and liquid-phase deposition. On this basis, it focuses on the typical applications and performance advantages of low-dimensional nanomaterials in optoelectronic devices such as photodetectors, solar cells, and light-emitting diodes. Finally, it deeply analyzes the main problems and challenges currently faced by this field from the aspects of uniformity and repeatability of material preparation, process compatibility of device integration, and cost and reliability of large-scale production, and prospects future research directions.