Hydrogen Sensing Characteristics of α-phase Ga2O3 Based Schottky Diode
Abstract An α-phase Ga2O3 (α-Ga2O3 ) thin film layer was grown on a sapphire substrate by halide vapor phase epitaxy (HVPE), and an α-Ga2 O3 based Schottky diode hydrogen sensor was fabricated. Hydrogen sensing characteristics on the α-Ga2O3 surface were investigated at temperature range from 25 to 500°C. The device showed a hydrogen responsivity of 187% for 500 ppm hydrogen exposure, and exhibited a distinctive current increase response to 50 -500 ppm hydrogen concentrations at 100°C. The hydrogen sensor presented a distinctive hydrogen response up to 500°C, and a decent hydrogen cross-selectivity over other gases including N₂, CO, CO2 , CH4 , NO2 , NH3 , and O2 . Furthermore, the effect of crystal structure of the α-Ga2O3 surface on the hydrogen sensing behavior was examined.
Authors
- Ji-Hyeon Park (ORCID: https://orcid.org/0000-0002-7114-0065)
- Dae‐Woo Jeon (ORCID: https://orcid.org/0000-0002-4896-6862)
- Soohwan Jang (ORCID: https://orcid.org/0000-0002-8188-6274)
- Minsang Yu (ORCID: https://orcid.org/0009-0001-3234-337X)
- JAEEUN SHIN (ORCID: https://orcid.org/0009-0009-2240-9900)
- JINHAN JUNG (ORCID: https://orcid.org/0009-0006-1302-8354)
Institutions
- Korea Institute of Ceramic Engineering and Technology (KR)
- Dankook University (KR)
Publication Details
- Journal
- ECS Journal of Solid State Science and Technology
- Published
- 2026-11-06
- DOI
- https://doi.org/10.1149/2162-8777/aebefb
- Primary Topic
- Gas Sensing Nanomaterials and Sensors
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- Korea Institute for Advancement of Technology