Resolving hidden interface-trap capture times through stochastic current transients in multitrap nanoscale transistors

Charge trapping at semiconductor–dielectric interfaces governs threshold-voltage instability, low-frequency noise, and stochastic variability in nanoscale transistors. In the intermediate multitrap regime, the drain-current transient is neither a defect-resolved signal from a single trap nor a fully averaged ensemble response, making the underlying trap kinetics difficult to infer directly. Here, a framework combining pulsed current–voltage measurement and self-consistent stochastic modeling is introduced for extracting statistical capture-time descriptors of interface-trap ensembles from sensing-phase drain-current transients. The approach analyzes repeated subthreshold transients using both the mean current and its cycle-to-cycle fluctuation, while explicitly incorporating trap-to-trap dispersion, sensing-bias-dependent capture kinetics, and electrostatic feedback induced by progressive trap filling. Simultaneous fitting across multiple sensing biases identifies a common model-constrained parameter pair within an assumed log-normal parameterization of the capture-time-constant distribution. Within the assumed model, this analysis distinguishes intrinsic trap-to-trap kinetic disorder from measurement-induced electrostatic renormalization, revealing that the measured transient is not a direct image of the intrinsic time-constant spectrum but a dynamically reshaped response governed by finite-ensemble stochasticity and channel electrostatics. The framework provides a physics-based route for extracting hidden multitrap kinetic descriptors from stochastic electronic transients in nanoscale devices.

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Publication Details

Journal
Scientific Reports
Published
2026-11-06
DOI
https://doi.org/10.1038/s41598-026-75652-4
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Resolving hidden interface-trap capture times through stochastic current transients in multitrap nanoscale transistors

Sungho Kim, Dokyoung Lee, Joon-Kyu Han, Jun-Young Park
Scientific Reports
Semiconductor materials and devices
article

Resolving hidden interface-trap capture times through stochastic current transients in multitrap nanoscale transistors

Sungho Kim, Dokyoung Lee, Joon-Kyu Han, Jun-Young Park
article en

Abstract

Charge trapping at semiconductor–dielectric interfaces governs threshold-voltage instability, low-frequency noise, and stochastic variability in nanoscale transistors. In the intermediate multitrap regime, the drain-current transient is neither a defect-resolved signal from a single trap nor a fully averaged ensemble response, making the underlying trap kinetics difficult to infer directly. Here, a framework combining pulsed current–voltage measurement and self-consistent stochastic modeling is introduced for extracting statistical capture-time descriptors of interface-trap ensembles from sensing-phase drain-current transients. The approach analyzes repeated subthreshold transients using both the mean current and its cycle-to-cycle fluctuation, while explicitly incorporating trap-to-trap dispersion, sensing-bias-dependent capture kinetics, and electrostatic feedback induced by progressive trap filling. Simultaneous fitting across multiple sensing biases identifies a common model-constrained parameter pair within an assumed log-normal parameterization of the capture-time-constant distribution. Within the assumed model, this analysis distinguishes intrinsic trap-to-trap kinetic disorder from measurement-induced electrostatic renormalization, revealing that the measured transient is not a direct image of the intrinsic time-constant spectrum but a dynamically reshaped response governed by finite-ensemble stochasticity and channel electrostatics. The framework provides a physics-based route for extracting hidden multitrap kinetic descriptors from stochastic electronic transients in nanoscale devices.

Scientific ReportsVol. 16(1)
Ewha Womans University (KR), Seoul National University (KR)
National Research Foundation of Korea, Ministry of Education, India, Ministry of Science and ICT, South Korea
Openalex Percentile: Top 26%
Semiconductor materials and devices
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