Effect of thermal annealing on EUV reflectivity of Mo/Si multilayers with Si3N4 interlayers

This study investigates the effects of annealing on the structural and optical properties of Mo/Si-based multilayer thin films with a deposited Si3N4 interlayer. Annealing was selected as a key process parameter, and samples were fabricated under various deposition conditions. The fabricated samples were evaluated for their optical and surface properties according to the process conditions, and the annealed samples were analyzed using high-resolution transmission electron microscopy (HRTEM) to examine microstructural and interfacial changes. The results provide valuable insights for the design and post-deposition optimization of multilayer structures in extreme ultraviolet (EUV) applications.