Structural and Esaki-Diode-like Electrical Properties of PLD-Grown 2D MoS2 Film on MBE Grown AlN/Si(111) Heterostructures

MoS2 thin films were synthesized via pulsed laser deposition (PLD) onto AlN/Si(111) templates, where the AlN buffer layers (110 and 200 nm thick) were grown by molecular beam epitaxy. We achieved excellent MoS2 thickness uniformity (≈3 monolayers) and confirmed the conformal coverage of the PLD-grown films by Raman mapping. Transmission electron microscopy analysis confirmed the epitaxial character of the AlN film and the presence of an ultrathin aluminum oxynitride layer on its surface. Following X-ray photoelectron spectroscopy analysis, oxygen impurities were confirmed in the bulk AlN film as well. Heterojunctions between the ultrathin MoS2 film and AlN, investigated by current-voltage characterization of vertical diode structures, exhibit Esaki-diode-like behavior with a negative-resistance zone. A diagram of the energy bands and Fermi levels in the heterostructure composed of the thick oxygen-doped AlN film sandwiched between the MoS2 and Si electrodes was proposed, and the observed Esaki-diode-like current-voltage characteristic was attributed to electron tunneling from the oxygen impurity band in the AlN film into the valence band of the degenerate p-MoS2 film.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2026-11-01
DOI
https://doi.org/10.1021/acsami.6c11190
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
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article

Structural and Esaki-Diode-like Electrical Properties of PLD-Grown 2D MoS2 Film on MBE Grown AlN/Si(111) Heterostructures

M. Gregor, Yvon Cordier, Alica Rosova, Marián Precner et al.
ACS Applied Materials & Interfaces
2D Materials and Applications
article

Structural and Esaki-Diode-like Electrical Properties of PLD-Grown 2D MoS2 Film on MBE Grown AlN/Si(111) Heterostructures

M. Gregor, Yvon Cordier, Alica Rosova, Marián Precner, Marianna Spankova, Marcel Talacko, Edmund Dobročka, Filippo Giannazzo, Stefan Chromik, Salvatore Ethan Panasci, Martin Moško, Éric Frayssinet, Gabriel Vanko, Peter Švec
article en

Abstract

MoS2 thin films were synthesized via pulsed laser deposition (PLD) onto AlN/Si(111) templates, where the AlN buffer layers (110 and 200 nm thick) were grown by molecular beam epitaxy. We achieved excellent MoS2 thickness uniformity (≈3 monolayers) and confirmed the conformal coverage of the PLD-grown films by Raman mapping. Transmission electron microscopy analysis confirmed the epitaxial character of the AlN film and the presence of an ultrathin aluminum oxynitride layer on its surface. Following X-ray photoelectron spectroscopy analysis, oxygen impurities were confirmed in the bulk AlN film as well. Heterojunctions between the ultrathin MoS2 film and AlN, investigated by current-voltage characterization of vertical diode structures, exhibit Esaki-diode-like behavior with a negative-resistance zone. A diagram of the energy bands and Fermi levels in the heterostructure composed of the thick oxygen-doped AlN film sandwiched between the MoS2 and Si electrodes was proposed, and the observed Esaki-diode-like current-voltage characteristic was attributed to electron tunneling from the oxygen impurity band in the AlN film into the valence band of the degenerate p-MoS2 film.

ACS Applied Materials & Interfaces
Centre National de la Recherche Scientifique (FR), Université Côte d'Azur (FR), Czech Academy of Sciences (CZ), Slovak Academy of Sciences (SK), National Research Council (IT), Institute for Microelectronics and Microsystems (IT), Comenius University Bratislava (SK)
Slovenská Akadémia Vied, Agentúra na Podporu Výskumu a Vývoja, Vedecká Grantová Agentúra MŠVVaŠ SR a SAV, NextGenerationEU
Openalex Percentile: Top 29%
2D Materials and Applications
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