In Situ Fabrication of h-BN/Graphene Heterostructures for Robust Electrical Performance in Atmospheric Conditions

Abstract Hexagonal boron nitride (h-BN)/graphene heterostructures offer an effective route to preserve the intrinsic electronic properties of graphene; however, direct chemical vapor deposition (CVD) growth of h-BN on graphene often leads to graphene etching and performance degradation. Here, we reported an in situ CVD strategy for fabricating large-area h-BN/graphene heterostructures by establishing a graphene dynamic growth-etching equilibrium during the h-BN deposition process. By continuously supplying a trace amount of carbon source, the graphene layer was maintained in a quasi-equilibrium state, effectively suppressing hydrogen-induced etching while preventing further lateral growth. The validity of this approach was further confirmed through a comparative analysis of Raman spectra collected at different growth stages. Comprehensive structural characterizations confirmed the high crystalline quality and uniformity of the h-BN/graphene heterostructures. Field-effect transistors (FETs) based on such heterostructures exhibited high carrier mobilities exceeding 20,000 cm2·V−1·s−1, low carrier concentrations below 3 × 1011 cm−2, excellent batch-to-batch reproducibility, and pronounced electron−hole symmetry. Importantly, h-BN/graphene devices demonstrated enhanced environmental stability under prolonged ambient exposure. Although a moderate decrease in mobility was observed during the initial ∼12 days, the devices subsequently exhibited remarkably stable electrical performance as the graphene layer remained effectively protected from further doping by the blocking effect of h-BN. Compared with bare graphene devices, h-BN/graphene devices exhibited higher carrier mobility and lower carrier concentration in atmospheric conditions. Such a growth-etching equilibrium strategy provides a general and scalable route for preserving graphene integrity during heterostructure growth and enables robust graphene-based electronic devices for long-term operation under ambient conditions.

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Publication Details

Journal
ACS Applied Nano Materials
Published
2026-10-31
DOI
https://doi.org/10.1021/acsanm.6c02959
Primary Topic
Graphene research and applications
Type
article
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article

In Situ Fabrication of h-BN/Graphene Heterostructures for Robust Electrical Performance in Atmospheric Conditions

Ning Hou, Huawen Wang, Ruiqi Zhang, Xinru Zhang et al.
ACS Applied Nano Materials
Graphene research and applications
article

In Situ Fabrication of h-BN/Graphene Heterostructures for Robust Electrical Performance in Atmospheric Conditions

Ning Hou, Huawen Wang, Ruiqi Zhang, Xinru Zhang, Xin Li
article en

Abstract

Abstract Hexagonal boron nitride (h-BN)/graphene heterostructures offer an effective route to preserve the intrinsic electronic properties of graphene; however, direct chemical vapor deposition (CVD) growth of h-BN on graphene often leads to graphene etching and performance degradation. Here, we reported an in situ CVD strategy for fabricating large-area h-BN/graphene heterostructures by establishing a graphene dynamic growth-etching equilibrium during the h-BN deposition process. By continuously supplying a trace amount of carbon source, the graphene layer was maintained in a quasi-equilibrium state, effectively suppressing hydrogen-induced etching while preventing further lateral growth. The validity of this approach was further confirmed through a comparative analysis of Raman spectra collected at different growth stages. Comprehensive structural characterizations confirmed the high crystalline quality and uniformity of the h-BN/graphene heterostructures. Field-effect transistors (FETs) based on such heterostructures exhibited high carrier mobilities exceeding 20,000 cm2·V−1·s−1, low carrier concentrations below 3 × 1011 cm−2, excellent batch-to-batch reproducibility, and pronounced electron−hole symmetry. Importantly, h-BN/graphene devices demonstrated enhanced environmental stability under prolonged ambient exposure. Although a moderate decrease in mobility was observed during the initial ∼12 days, the devices subsequently exhibited remarkably stable electrical performance as the graphene layer remained effectively protected from further doping by the blocking effect of h-BN. Compared with bare graphene devices, h-BN/graphene devices exhibited higher carrier mobility and lower carrier concentration in atmospheric conditions. Such a growth-etching equilibrium strategy provides a general and scalable route for preserving graphene integrity during heterostructure growth and enables robust graphene-based electronic devices for long-term operation under ambient conditions.

ACS Applied Nano Materials
Chinese Academy of Sciences (CN), Yangtze Normal University (CN), University of Chinese Academy of Sciences (CN)
Openalex Percentile: Top 29%
Graphene research and applications
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