Crystal Integrity Suppresses Bulk Trapping in Potassium Poly(Heptazine Imide) for Selective Polyester Photoreforming

ABSTRACT Bulk defects in organic semiconductor photocatalysts intercept photogenerated charges before interfacial reaction, constraining activity and selectivity. Here, seeded molten‐salt recrystallization yields potassium poly(heptazine imide) (PHI‐K) nanocrystals with reduced cyano content and enhanced lattice coherence for polyester photoreforming. Density functional theory and transient absorption spectroscopy identify cyano‐derived occupied states as bulk hole traps. Defect suppression preserves observable hole‐polaron absorption and extends the average exciton‐associated absorption decay time from 69.52 to 984.72 ps, consistent with reduced trap‐assisted carrier loss. Under air mass 1.5 global (AM 1.5G) irradiation, crystalline PHI‐K photoreforms alkaline‐pretreated poly(glycolic acid) and poly(lactic acid) into glyoxylic and pyruvic acids with respective target‐product carbon yields of 95.2% and 92.5%. Corresponding H 2 evolution rates reach 42.6 and 26.0 mmol g −1 h −1 , with apparent quantum yields of 50.8% and 30.1% at 400 nm, respectively. In situ infrared spectroscopy, isotope effects, and carrier kinetics support a pathway in which holes drive two‐electron oxidation of surface‐bound α‐hydroxy species while electrons reduce protons on Pt. These findings establish crystal integrity as an organic semiconductor materials principle that couples bulk charge retention to selective bond conversion in conjugated photocatalysts.

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Publication Details

Journal
Advanced Materials
Published
2026-10-31
DOI
https://doi.org/10.1002/adma.75601
Primary Topic
Advanced Photocatalysis Techniques
Type
article
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article

Crystal Integrity Suppresses Bulk Trapping in Potassium Poly(Heptazine Imide) for Selective Polyester Photoreforming

Yongfa Zhu, Xinghao Qi, Qixin Zhou, Yan Guo et al.
Advanced Materials
Advanced Photocatalysis Techniques
article

Crystal Integrity Suppresses Bulk Trapping in Potassium Poly(Heptazine Imide) for Selective Polyester Photoreforming

Yongfa Zhu, Xinghao Qi, Qixin Zhou, Yan Guo, Yizhou Yan, Xu Zhang
article en

Abstract

ABSTRACT Bulk defects in organic semiconductor photocatalysts intercept photogenerated charges before interfacial reaction, constraining activity and selectivity. Here, seeded molten‐salt recrystallization yields potassium poly(heptazine imide) (PHI‐K) nanocrystals with reduced cyano content and enhanced lattice coherence for polyester photoreforming. Density functional theory and transient absorption spectroscopy identify cyano‐derived occupied states as bulk hole traps. Defect suppression preserves observable hole‐polaron absorption and extends the average exciton‐associated absorption decay time from 69.52 to 984.72 ps, consistent with reduced trap‐assisted carrier loss. Under air mass 1.5 global (AM 1.5G) irradiation, crystalline PHI‐K photoreforms alkaline‐pretreated poly(glycolic acid) and poly(lactic acid) into glyoxylic and pyruvic acids with respective target‐product carbon yields of 95.2% and 92.5%. Corresponding H 2 evolution rates reach 42.6 and 26.0 mmol g −1 h −1 , with apparent quantum yields of 50.8% and 30.1% at 400 nm, respectively. In situ infrared spectroscopy, isotope effects, and carrier kinetics support a pathway in which holes drive two‐electron oxidation of surface‐bound α‐hydroxy species while electrons reduce protons on Pt. These findings establish crystal integrity as an organic semiconductor materials principle that couples bulk charge retention to selective bond conversion in conjugated photocatalysts.

Advanced Materials
University of Science and Technology of China (CN), City University of Hong Kong (HK), Anhui Normal University (CN), Tsinghua University (CN)
Openalex Percentile: Top 35%
Advanced Photocatalysis Techniques
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Crystal Integrity Suppresses Bulk Trapping in Potassium Poly(Heptazine Imide) for Selective Polyester Photoreforming — Yongfa Zhu, Xinghao Qi, et al. · Advanced Materials (2026) | TGRS Research Map | TGRS