Probe‐Loaded Coaxial Cavity With High Quality Factor for Complex Permittivity Measurement

ABSTRACT This paper presents the probe‐loaded coaxial resonant cavity. The probe is non‐contact, embedded within the inner conductor of the re‐entry coaxial cavity. The probe emits a portion of the resonant cavity's energy, which is then applied to the material under measurement. This process enables the assessment of complex permittivity in thin‐film materials. Through simulation analysis of key parameters such as probe embedding depth, length, and gap, it was discovered that the probe embedding depth exhibits considerable tolerance toward the requirements for high‐quality‐factor design. It has been demonstrated that designers do not necessarily require precise control over the probe embedding depth to achieve a relatively high quality factor. This approach has been demonstrated to be highly advantageous for both the design and practical assembly of resonant cavities. The complex permittivity of the substrate was measured using the resonant cavity perturbation method, with the resultant data indicating a quality factor greater than 1800 at the TEM 001 mode. It has been demonstrated through experimental measurements that the proposed cavity is capable of producing reliable results when it comes to substrate measurement.

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Publication Details

Journal
Microwave and Optical Technology Letters
Published
2026-10-29
DOI
https://doi.org/10.1002/mop.70845
Primary Topic
Microwave and Dielectric Measurement Techniques
Type
article
Field-Weighted Citation Impact
0.00

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Probe‐Loaded Coaxial Cavity With High Quality Factor for Complex Permittivity Measurement

Nan Chen, Xue Niu, Chong Gao, Hui Zhu et al.
1 links
Microwave and Optical Technology Letters
Microwave and Dielectric Measurement Techniques
article

Probe‐Loaded Coaxial Cavity With High Quality Factor for Complex Permittivity Measurement

Nan Chen, Xue Niu, Chong Gao, Hui Zhu, En Li
article en

Abstract

ABSTRACT This paper presents the probe‐loaded coaxial resonant cavity. The probe is non‐contact, embedded within the inner conductor of the re‐entry coaxial cavity. The probe emits a portion of the resonant cavity's energy, which is then applied to the material under measurement. This process enables the assessment of complex permittivity in thin‐film materials. Through simulation analysis of key parameters such as probe embedding depth, length, and gap, it was discovered that the probe embedding depth exhibits considerable tolerance toward the requirements for high‐quality‐factor design. It has been demonstrated that designers do not necessarily require precise control over the probe embedding depth to achieve a relatively high quality factor. This approach has been demonstrated to be highly advantageous for both the design and practical assembly of resonant cavities. The complex permittivity of the substrate was measured using the resonant cavity perturbation method, with the resultant data indicating a quality factor greater than 1800 at the TEM 001 mode. It has been demonstrated through experimental measurements that the proposed cavity is capable of producing reliable results when it comes to substrate measurement.

Microwave and Optical Technology LettersVol. 68(11)
University of Electronic Science and Technology of China (CN)
National Natural Science Foundation of China, Fundamental Research Funds for the Central Universities
Openalex Percentile: Top 24%
Microwave and Dielectric Measurement Techniques
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