Toward Human-Centered Lithography Environments: Seven Reasons to Replace Yellow Lighting with Candlelight-Style LED Illumination
Semiconductor manufacturing relies on specialized yellow lighting in lithography fabs to reduce photoresist degradation, but the spectral characteristics of such lighting also motivate evaluation of its effects on human-related responses. This study evaluates whether candlelight-style LED illumination can serve as an alternative lighting condition while maintaining photoresist compatibility. We compare the two lighting conditions across fabrication-related measurements, spectral calculations, questionnaire responses, concentration maintenance, viewing clarity, and intraocular pressure. The results include a smaller increase in photoresist viscosity under an accelerated exposure test, differences in calculated MPE and MSS values, descriptive differences in questionnaire responses, concentration-maintenance trends, and visual-response measurements. Because several outcomes are descriptive or modeled and some experimental details could not be independently verified from the retained records, the findings are interpreted cautiously.
Authors
- Po‐Ting Yeh (ORCID: https://orcid.org/0000-0002-0461-8778)
- Pei-Chung Tsai
- Dipanshu Sharma (ORCID: https://orcid.org/0009-0006-3990-974X)
- Jwo‐Huei Jou (ORCID: https://orcid.org/0000-0002-9413-0206)
- Tun-Hao Chen
- Shiang-Yi Lee
- Kunhua Lee (ORCID: https://orcid.org/0000-0002-1426-6761)
- Hong-Wei Yang
- Xian-Qing Huang
Institutions
- National Tsing Hua University (TW)
- National Taiwan University Hospital (TW)
Publication Details
- Journal
- Optoelectronics
- Published
- 2026-10-29
- DOI
- https://doi.org/10.3390/optoelectronics1010004
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00