Synergistic Effects of Surfactants on Ceria Removal Efficiency during SC1-based Post-CMP Cleaning

This study aims to enhance SC1-based post-CMP cleaning efficiency by evaluating various surfactants for effective CeO 2 particle removal from SiO 2 surfaces. Among the tested surfactants, Sarkosyl NL demonstrated superior performance, achieving a removal efficiency of 97.85%. Its anionic nature promotes electrostatic repulsion, preventing particle redeposition, while its thermal stability ensures consistent cleaning efficiency even under prolonged heating. Effective micelle formation further enhances particle dispersion. These findings highlight potential of Sarkosyl NL to improve SC1-based cleaning processes, offering valuable insights for optimizing surfactant formulations to achieve higher particle removal efficiency and surface cleanliness in semiconductor manufacturing.