Metallic Contamination Control in CMOS Image Sensor Processing
We have extensively reviewed metallic contamination issues including the detection, analysis, prevention, and gettering in CMOS image sensor processing. High sensitivity metallic contamination detection techniques are required for the metallic contamination control. Better understanding the penetration, diffusion, and gettering behaviors of metal impurities and the gettering design based on the physical properties of metals are required for controlling yield of CMOS image sensors.
Authors
- Koichiro Saga (ORCID: https://orcid.org/0000-0002-4293-4966)
Institutions
- Sony Semiconductor Solutions Corporation (Japan) (JP)
Publication Details
- Journal
- Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
- Published
- 2026-10-29
- DOI
- https://doi.org/10.4028/p-2zr5d3
- Primary Topic
- Semiconductor materials and interfaces
- Type
- article
- Field-Weighted Citation Impact
- 0.00