Metallic Contamination Control in CMOS Image Sensor Processing

We have extensively reviewed metallic contamination issues including the detection, analysis, prevention, and gettering in CMOS image sensor processing. High sensitivity metallic contamination detection techniques are required for the metallic contamination control. Better understanding the penetration, diffusion, and gettering behaviors of metal impurities and the gettering design based on the physical properties of metals are required for controlling yield of CMOS image sensors.

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Publication Details

Journal
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Published
2026-10-29
DOI
https://doi.org/10.4028/p-2zr5d3
Primary Topic
Semiconductor materials and interfaces
Type
article
Field-Weighted Citation Impact
0.00
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article

Metallic Contamination Control in CMOS Image Sensor Processing

Koichiro Saga
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena
Semiconductor materials and interfaces
article

Metallic Contamination Control in CMOS Image Sensor Processing

Koichiro Saga
article en

Abstract

We have extensively reviewed metallic contamination issues including the detection, analysis, prevention, and gettering in CMOS image sensor processing. High sensitivity metallic contamination detection techniques are required for the metallic contamination control. Better understanding the penetration, diffusion, and gettering behaviors of metal impurities and the gettering design based on the physical properties of metals are required for controlling yield of CMOS image sensors.

Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomenaVol. 395
Sony Semiconductor Solutions Corporation (Japan) (JP)
Openalex Percentile: Top 20%
Semiconductor materials and interfaces
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