Vacuum Annealing Effects on the Transport and Thermoelectric Properties of the Novel Layered Bi-chalcogenide LaOBiSnS3

Abstract The impact of annealing on the transport and thermoelectric properties of the novel layered Bi-chalcogenide LaOBiSnS3 is investigated. Electrical transport measurements show that annealing strongly suppresses the resistivity, and that a single thermally activated conduction model is no longer sufficient to describe the low-temperature transport. Hall-effect measurements indicate that the resistivity reduction is dominated by a pronounced enhancement of carrier mobility, while the carrier concentration increases only moderately. At higher temperatures (300-773 K), the thermoelectric figure of merit ZT is significantly improved, reaching approximately 0.20 at 773 K for the annealed sample. These findings suggest that post-annealing treatment is an effective route to enhance the thermoelectric performance of BiS2-based layered materials, primarily by improving carrier mobility.

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Publication Details

Journal
Materials Research Express
Published
2026-10-28
DOI
https://doi.org/10.1088/2053-1591/aebaf0
Primary Topic
Advanced Thermoelectric Materials and Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Vacuum Annealing Effects on the Transport and Thermoelectric Properties of the Novel Layered Bi-chalcogenide LaOBiSnS3

汪春昌, Yi Yu, Chao Cheng
1 links
Materials Research Express
Advanced Thermoelectric Materials and Devices
article

Vacuum Annealing Effects on the Transport and Thermoelectric Properties of the Novel Layered Bi-chalcogenide LaOBiSnS3

汪春昌, Yi Yu, Chao Cheng
article en

Abstract

Abstract The impact of annealing on the transport and thermoelectric properties of the novel layered Bi-chalcogenide LaOBiSnS3 is investigated. Electrical transport measurements show that annealing strongly suppresses the resistivity, and that a single thermally activated conduction model is no longer sufficient to describe the low-temperature transport. Hall-effect measurements indicate that the resistivity reduction is dominated by a pronounced enhancement of carrier mobility, while the carrier concentration increases only moderately. At higher temperatures (300-773 K), the thermoelectric figure of merit ZT is significantly improved, reaching approximately 0.20 at 773 K for the annealed sample. These findings suggest that post-annealing treatment is an effective route to enhance the thermoelectric performance of BiS2-based layered materials, primarily by improving carrier mobility.

Materials Research Express
Anhui University (CN)
National Natural Science Foundation of China, Anhui Provincial Department of Science and Technology, Anhui Provincial Department of Education, Natural Science Foundation of Anhui Province, University Natural Science Research Project of Anhui Province
Openalex Percentile: Top 29%
Advanced Thermoelectric Materials and Devices
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