Distinct Photoemission Behaviors in Monolayer WSe 2 : Unidirectional Asymmetry From Edge Defects Versus Bidirectional Expansion From Plasmons

ABSTRACT 2D transition metal dichalcogenides (TMDs) hold promise for next‐generation flexible optoelectronic devices owing to their atomic thickness. The performance of such devices is fundamentally governed by the excitation, relaxation, and recombination of photogenerated carriers. Defect engineering based on point defects has been used to manipulate these carrier dynamics, yet the potential of alternative strategies such as 1D defects or external plasmonic fields remains unexplored. Here, by combining time‐resolved photoemission electron microscopy (TR‐PEEM) with first‐principles calculations, we demonstrate that 1D edge‐structural defects in monolayer WSe 2 induce an asymmetric broadening of the photoelectron energy distribution, preferentially extending to high‐energy states, in stark contrast to the behavior of 0D point defects. By introducing a plasmonic synergistic effect, we further demonstrate that the near‐field effect synergizes with the edge defects, boosting the photoelectron yield to approximately 369.8% (relative to the intrinsic region) while TR‐PEEM reveals no significant lifetime penalty relative to the edge‐rich region. This system induces a bidirectional extension of the photoelectron energy distribution, amplifying both low‐ and high‐energy photoelectron signals. Our findings reveal that boundary‐induced symmetry breaking and electronic reconstruction can relax the trade‐off between carrier generation and recombination, offering a pathway toward high‐efficiency, low‐loss optoelectronic devices based on 2D materials.

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Small
Published
2026-10-27
DOI
https://doi.org/10.1002/smll.76467
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
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article

Distinct Photoemission Behaviors in Monolayer WSe 2 : Unidirectional Asymmetry From Edge Defects Versus Bidirectional Expansion From Plasmons

Xiaowei Song, Boyu Ji, Libo Gao, Peng Lang et al.
2 links
Small
2D Materials and Applications
article

Distinct Photoemission Behaviors in Monolayer WSe 2 : Unidirectional Asymmetry From Edge Defects Versus Bidirectional Expansion From Plasmons

Xiaowei Song, Boyu Ji, Libo Gao, Peng Lang, Jingquan Lin, Guowen Yuan, Jiuye Chen, Zhenhua Wang, Wenbin Zhao, Yang Xu, Jiali Liu, Zhenlong Zhao, Changlong Tan
article en

Abstract

ABSTRACT 2D transition metal dichalcogenides (TMDs) hold promise for next‐generation flexible optoelectronic devices owing to their atomic thickness. The performance of such devices is fundamentally governed by the excitation, relaxation, and recombination of photogenerated carriers. Defect engineering based on point defects has been used to manipulate these carrier dynamics, yet the potential of alternative strategies such as 1D defects or external plasmonic fields remains unexplored. Here, by combining time‐resolved photoemission electron microscopy (TR‐PEEM) with first‐principles calculations, we demonstrate that 1D edge‐structural defects in monolayer WSe 2 induce an asymmetric broadening of the photoelectron energy distribution, preferentially extending to high‐energy states, in stark contrast to the behavior of 0D point defects. By introducing a plasmonic synergistic effect, we further demonstrate that the near‐field effect synergizes with the edge defects, boosting the photoelectron yield to approximately 369.8% (relative to the intrinsic region) while TR‐PEEM reveals no significant lifetime penalty relative to the edge‐rich region. This system induces a bidirectional extension of the photoelectron energy distribution, amplifying both low‐ and high‐energy photoelectron signals. Our findings reveal that boundary‐induced symmetry breaking and electronic reconstruction can relax the trade‐off between carrier generation and recombination, offering a pathway toward high‐efficiency, low‐loss optoelectronic devices based on 2D materials.

Small
Harbin University of Science and Technology (CN), Changchun University of Science and Technology (CN), Harbin University (CN), Collaborative Innovation Center of Advanced Microstructures (CN), National Laboratory of Solid State Microstructures (CN), Nanjing University (CN)
National Natural Science Foundation of China, People's Government of Jilin Province, National Key Research and Development Program of China
Openalex Percentile: Top 29%
2D Materials and Applications
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