Zero-Shot Multi-Class Wafer Map Classification with Rule-Ordered Prompts for Large Multimodal Models
Wafer-map defect classification often requires labeled data and retraining when production conditions change. We present a training-free six-class framework that combines connected-component highlighting with morphology-, location-, and exclusion-aware prompts for a frozen large multimodal model. On Mixed-WM38 (6,866 maps), multi-region prompting achieves 92.9% macro and 93.8% overall accuracy. On WM811K (9,000 maps), it achieves 79.1% and 81.3%, respectively. Eight alternative rule orders achieve 90.1-91.9% overall accuracy, compared with 93.8% for the selected order.
Authors
- Tianjian Cao (ORCID: https://orcid.org/0009-0006-9170-096X)
- Jun Tao
Publication Details
- Journal
- arXiv (Cornell University)
- Published
- 2026-10-26
- DOI
- https://doi.org/10.48550/arxiv.2610.35080
- Primary Topic
- Industrial Vision Systems and Defect Detection
- Type
- preprint