Scanless Centimeter‐Scale Microstereolithography Enabled by Source‐Plane Angular Conditioning

Achieving centimeter-scale scanless microstereolithography remains challenging in conventional projection microstereolithography (PµSL), where improving resolution inevitably restricts printable area due to the finite number of pixels. High-pixel-density LCD modulators provide a promising pathway to relax this limitation, but their large emission area introduces severe optical coupling and illumination nonuniformity in reduction projection systems. Here, we introduce source-plane angular conditioning implemented in an LCD-based microstereolithography (LµSL) platform. This optical strategy reshapes the emission angular distribution of a planar light source, enabling efficient pupil matching and uniform wide-field illumination for scanless projection across centimeter-scale areas. Using an 8K LCD modulator and wide-angle lenses with different focal lengths, the system achieves projected pixel pitches of ≈1-3 µm over printable areas of ≈0.8-2.4 cm in a single exposure without mechanical scanning, stitching, or relay optics. Diverse microstructures-including stripe arrays, microneedle arrays, octet-truss lattices, and complex freeform geometries-are fabricated to demonstrate the platform's capability for heterogeneous, multi-scale microfabrication. The proposed optical framework establishes a practical route toward high-resolution, large-area microfabrication and provides a scalable platform for applications in microfluidics, biomedical devices, photonics, and architected materials.