Noncontact friction of a semiconductor with charge carriers of differing mobilities

The coefficient of noncontact friction as measured in an electric force microscopy experiment is computed for a semiconductor with positive and negative charge carriers of distinct mobilities. The friction is determined for a sample represented by classical electrodynamics coupled to diffusing carriers in a dielectric continuum. The analysis generalizes previous work in which positive and negative carriers were taken to have identical mobilities, allowing application to a wider range of semiconductors. Dielectric and electrical properties of the material are shown to be revealed by the dependence of the friction on experimentally accessible parameters such as probe-sample separation and carrier density.

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Publication Details

Journal
The Journal of Chemical Physics
Published
2026-10-22
DOI
https://doi.org/10.1063/5.0355144
Primary Topic
Force Microscopy Techniques and Applications
Type
article
Field-Weighted Citation Impact
0.00
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article

Noncontact friction of a semiconductor with charge carriers of differing mobilities

Roger F. Loring
The Journal of Chemical Physics
Force Microscopy Techniques and Applications
article

Noncontact friction of a semiconductor with charge carriers of differing mobilities

Roger F. Loring
article en

Abstract

The coefficient of noncontact friction as measured in an electric force microscopy experiment is computed for a semiconductor with positive and negative charge carriers of distinct mobilities. The friction is determined for a sample represented by classical electrodynamics coupled to diffusing carriers in a dielectric continuum. The analysis generalizes previous work in which positive and negative carriers were taken to have identical mobilities, allowing application to a wider range of semiconductors. Dielectric and electrical properties of the material are shown to be revealed by the dependence of the friction on experimentally accessible parameters such as probe-sample separation and carrier density.

The Journal of Chemical PhysicsVol. 165(16)
Cornell University (US)
Openalex Percentile: Top 19%
Force Microscopy Techniques and Applications
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