RFL Applications II: Double-Slit Interference and the Emergence of the Interference Pattern

This is the second companion paper to the Relative Field Localization (RFL) framework (RFL v8.0). It presents a physical account of the double-slit experiment within RFL. In RFL, the electron is treated as an extended wavepacket of conserved charge with an oscillating phase. When the wavepacket reaches the slits, it splits into two components that overlap and interfere behind the barrier. The interference pattern appears in the charge density j^0. At the screen, the charge localizes into a Q-ball at the peak of j^0, producing a single dot per electron. Over many electrons, the distribution of dots follows the Born rule |ψ|², and the interference pattern emerges statistically. When a measurement apparatus is placed at the slits, the interaction triggers localization before the electron reaches the screen, and the pattern disappears. The analysis covers:• The extended wavepacket before the slits, with Gaussian envelope and oscillating phase• The splitting of the wavepacket at the slits into two spherical components• The interference of the two components behind the barrier• The localization at the screen and the emergence of a single dot• The statistical buildup of the interference pattern from 1 to 100,000 electrons• The disappearance of the pattern when measurement is performed at the slits• The stochastic trajectory of the charge peak The account follows from the RFL localization law τ_loc = S_RL · L³ · m². This paper is the second in a series of three companion papers. The other two are:• RFL Applications I: Thermal Effects in Quantum Computing• RFL Applications III: Compton Scattering and the Measurement Mechanism