Interfacial Built-In Electric Field-Driven S-Scheme g-C3N4/S-Doped TiO2 Heterojunction for Boosting Photocatalytic NO Abatement

Abstract S-scheme heterojunction engineering has emerged as an effective strategy for enhancing photocatalytic NO removal by facilitating charge separation while maintaining strong redox capability. Herein, an S-scheme heterojunction consisting of S-doped TiO2 nanotubes and g-C3N4 was successfully constructed via an annealing-assisted interfacial engineering strategy. Comprehensive band structure analyses using Mott–Schottky measurements, valence band X-ray photoelectron spectroscopy, and Kelvin probe force microscopy confirmed the formation of an S-scheme heterojunction between S-TiO2 and g-C3N4. The experimental results revealed a favorable band alignment and the establishment of an interfacial built-in electric field between S-TiO2 and g-C3N4, facilitating S-scheme charge transfer across the heterointerface and preserving highly reactive electrons and holes with strong reduction and oxidation capabilities, respectively, thereby promoting the generation of ·O2– and ·OH radicals. As a result, the optimized g-C3N4/S-doped TiO2 nanotube photocatalyst achieved an NO removal efficiency of 74.6%, higher than those of pristine S-TiO2 (43.4%) and g-C3N4 (53.4%), while also suppressing NO2 intermediate formation compared with previously reported TiO2- and g-C3N4-based heterojunctions. This work provides insight into the synergistic role of band alignment, interfacial built-in electric field, and S-scheme charge transfer in boosting photocatalytic NO removal performance.

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Publication Details

Journal
ACS Applied Materials & Interfaces
Published
2026-10-06
DOI
https://doi.org/10.1021/acsami.6c13087
Primary Topic
Advanced Photocatalysis Techniques
Type
article
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article

Interfacial Built-In Electric Field-Driven S-Scheme g-C3N4/S-Doped TiO2 Heterojunction for Boosting Photocatalytic NO Abatement

Viet Van Pham, Ali Anus, Sungjin Park, Tin Chanh Duc Doan et al.
ACS Applied Materials & Interfaces
Advanced Photocatalysis Techniques
article

Interfacial Built-In Electric Field-Driven S-Scheme g-C3N4/S-Doped TiO2 Heterojunction for Boosting Photocatalytic NO Abatement

Viet Van Pham, Ali Anus, Sungjin Park, Tin Chanh Duc Doan, Nhat Quang Minh Tran, Thach Khac Bui, Pho Thi Le
article en

Abstract

Abstract S-scheme heterojunction engineering has emerged as an effective strategy for enhancing photocatalytic NO removal by facilitating charge separation while maintaining strong redox capability. Herein, an S-scheme heterojunction consisting of S-doped TiO2 nanotubes and g-C3N4 was successfully constructed via an annealing-assisted interfacial engineering strategy. Comprehensive band structure analyses using Mott–Schottky measurements, valence band X-ray photoelectron spectroscopy, and Kelvin probe force microscopy confirmed the formation of an S-scheme heterojunction between S-TiO2 and g-C3N4. The experimental results revealed a favorable band alignment and the establishment of an interfacial built-in electric field between S-TiO2 and g-C3N4, facilitating S-scheme charge transfer across the heterointerface and preserving highly reactive electrons and holes with strong reduction and oxidation capabilities, respectively, thereby promoting the generation of ·O2– and ·OH radicals. As a result, the optimized g-C3N4/S-doped TiO2 nanotube photocatalyst achieved an NO removal efficiency of 74.6%, higher than those of pristine S-TiO2 (43.4%) and g-C3N4 (53.4%), while also suppressing NO2 intermediate formation compared with previously reported TiO2- and g-C3N4-based heterojunctions. This work provides insight into the synergistic role of band alignment, interfacial built-in electric field, and S-scheme charge transfer in boosting photocatalytic NO removal performance.

ACS Applied Materials & Interfaces
Vietnam National University Ho Chi Minh City (VN), Inha University (KR)
Openalex Percentile: Top 33%
Advanced Photocatalysis Techniques
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