AI-Based Image Enhancement Improves Detection of Interconnect Defects in Microelectronic Packaging

Abstract Traditional failure-analysis (FA) methods face growing challenges due to the increasing miniaturization and complexity of modern semiconductor devices. In particular, the detection of cracks in the extreme low K layers of flip-chips, utilized in advanced packaging architectures at the back end of line (BEOL), is challenging. To improve detectability of these so-called “white bumps”, we propose an AI-based image-enhancement workflow, specifically tailored to improve scanning acoustic microscopy (SAM) images. By applying a deep CNN with skip connections and network in network (DCSCN) model to low-resolution C-scan SAM images, we are able to improve the perceptual quality of images. Furthermore, this approach boosts resolution-dependent analysis methods like AI-based object detection of white-bump defects, improving the recall from 5.2% (95% CI: 0.1–26.0%) to 100.0% (95% CI: 82.2–100.0%). Our work demonstrates that AI-based image enhancement can significantly improve FA workflows, offering a robust and efficient solution for modern semiconductor analysis.

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Publication Details

Journal
Journal of Failure Analysis and Prevention
Published
2026-10-05
DOI
https://doi.org/10.1007/s11668-026-02537-z
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
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article

AI-Based Image Enhancement Improves Detection of Interconnect Defects in Microelectronic Packaging

Peter Czurratis, Hsien-Wei Ho, Roland Brunner, Tatjana Djuric-Rissner et al.
Journal of Failure Analysis and Prevention
Integrated Circuits and Semiconductor Failure Analysis
article

AI-Based Image Enhancement Improves Detection of Interconnect Defects in Microelectronic Packaging

Peter Czurratis, Hsien-Wei Ho, Roland Brunner, Tatjana Djuric-Rissner, Raphael Wilhelmer, Chun-Hsien Lee, Chun-Liang Kuo
article en

Abstract

Abstract Traditional failure-analysis (FA) methods face growing challenges due to the increasing miniaturization and complexity of modern semiconductor devices. In particular, the detection of cracks in the extreme low K layers of flip-chips, utilized in advanced packaging architectures at the back end of line (BEOL), is challenging. To improve detectability of these so-called “white bumps”, we propose an AI-based image-enhancement workflow, specifically tailored to improve scanning acoustic microscopy (SAM) images. By applying a deep CNN with skip connections and network in network (DCSCN) model to low-resolution C-scan SAM images, we are able to improve the perceptual quality of images. Furthermore, this approach boosts resolution-dependent analysis methods like AI-based object detection of white-bump defects, improving the recall from 5.2% (95% CI: 0.1–26.0%) to 100.0% (95% CI: 82.2–100.0%). Our work demonstrates that AI-based image enhancement can significantly improve FA workflows, offering a robust and efficient solution for modern semiconductor analysis.

Journal of Failure Analysis and Prevention
Advanced Semiconductor Engineering (Taiwan) (TW), PVA TePla (Germany) (DE), Materials Center Leoben (Austria) (AT)
Openalex Percentile: Top 22%
Integrated Circuits and Semiconductor Failure Analysis
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AI-Based Image Enhancement Improves Detection of Interconnect Defects in Microelectronic Packaging — Peter Czurratis, Hsien-Wei Ho, et al. · Journal of Failure Analysis and Prevention (2026) | TGRS Research Map | TGRS