Analytic-Composite Algorithm-Driven Holographic Femtosecond Laser Lithography for Rapid Prototyping of Multifunctional Terahertz Metasurfaces

Metasurfaces offer a transformative platform for ultracompact, multifunctional terahertz (THz) devices. However, realizing complex meta-units for advanced wavefront control and developing efficient fabrication methods still remain challenging. Herein, an advanced manufacturing platform based on holographic femtosecond laser lithography driven by an analytical-composite (AC) algorithm is proposed. This platform operates in a unit-by-unit manner, achieving a high-efficiency and high-throughput patterning. The AC algorithm achieves >80% holographic conversion efficiency, substantially surpassing traditional iterative methods (typically <50%). It generates rarely reported complex meta-units, such as multi-slit and concentrically nested multi-slit ring resonators, while simultaneously enabling full-parameter control (e.g., dimension, orientation angles) over these topologically intricate substructures. Each meta-unit, whether simple or complex, takes only 37 ms via unit-by-unit lithography, whereas point-by-point lithography scales with structural complexity. Consequently, 100 × 100 meta-units are fabricated within 10 min, outperforming point-by-point methods by an order of magnitude. The versatility and device-level performance of this approach are validated through three distinct high-performance THz devices: a triple-mode metalens for bifocal focusing, a quad-focus arrayed metalens, and a polarization-multiplexed holographic metasurface. All exhibit large-area uniformity, structural fidelity, and defect-free surfaces. This mask-free patterning lithography offers an efficient, complexity-independent fabrication of multifunctional metasurfaces across the THz spectrum and beyond.