Coulomb Blockade in Graphene Nano-islands Formed by Direct CVD Growth on Si/SiO 2 Substrate

Graphene nano-islands (GNIs) are promising building blocks for quantum devices owing to their unique potential. However, direct electrical measurements of GNIs have been challenging due to the requirement of metal catalysts in typical synthesis methods. In this study, we demonstrate electrical transport measurements of GNIs by using microwave plasma chemical vapor deposition, which is a catalyst-free method to deposit graphene directly on SiO 2 substrates. This approach enables the fabrication of metal electrodes on GNIs, allowing us to measure their quantum transport properties. At low temperatures, one of our devices shows clear Coulomb diamonds with twofold degeneracy, indicating the formation of a quantum dot and the lifting of valley degeneracy. The charge state of the GNI is also modulated by a local side gate, showing behavior similar to that observed with a global back gate. These results provide fundamental insights into GNI-based quantum devices relevant to next-generation computing.

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Publication Details

Journal
Journal of the Physical Society of Japan
Published
2026-09-25
DOI
https://doi.org/10.7566/jpsj.95.104602
Primary Topic
Graphene research and applications
Type
article
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article

Coulomb Blockade in Graphene Nano-islands Formed by Direct CVD Growth on Si/SiO 2 Substrate

Tomohiro Otsuka, Takeshi Kumasaka, Motoya Shinozaki, Shunsuke Yashima et al.
Journal of the Physical Society of Japan
Graphene research and applications
article

Coulomb Blockade in Graphene Nano-islands Formed by Direct CVD Growth on Si/SiO 2 Substrate

Tomohiro Otsuka, Takeshi Kumasaka, Motoya Shinozaki, Shunsuke Yashima, Kosuke Noro, Akiko Tada, Yuta Kera, あずさ 内海, Takashi Matsumoto, Yoshiyuki Kobayashi, Takumi Seo
article en

Abstract

Graphene nano-islands (GNIs) are promising building blocks for quantum devices owing to their unique potential. However, direct electrical measurements of GNIs have been challenging due to the requirement of metal catalysts in typical synthesis methods. In this study, we demonstrate electrical transport measurements of GNIs by using microwave plasma chemical vapor deposition, which is a catalyst-free method to deposit graphene directly on SiO 2 substrates. This approach enables the fabrication of metal electrodes on GNIs, allowing us to measure their quantum transport properties. At low temperatures, one of our devices shows clear Coulomb diamonds with twofold degeneracy, indicating the formation of a quantum dot and the lifting of valley degeneracy. The charge state of the GNI is also modulated by a local side gate, showing behavior similar to that observed with a global back gate. These results provide fundamental insights into GNI-based quantum devices relevant to next-generation computing.

Journal of the Physical Society of JapanVol. 95(10)
Tokyo Electron (Japan) (JP), Tohoku University (JP), National Institute for Materials Science (JP), Advanced Institute of Materials Science (JP), Spintronics Research Network of Japan (JP)
Openalex Percentile: Top 25%
Graphene research and applications
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Coulomb Blockade in Graphene Nano-islands Formed by Direct CVD Growth on Si/SiO 2 Substrate — Tomohiro Otsuka, Takeshi Kumasaka, et al. · Journal of the Physical Society of Japan (2026) | TGRS Research Map | TGRS