Analysis of the influence of magnetic field on polishing results in reciprocating magnetorheological polishing

In this paper, a magnetic field device applicable to reciprocating magnetorheological polishing (RMRP) is designed, and the influence of excitation current as well as working gap on the device's magnetic field performance is systematically studied. Specifically, the structure of the RMRP magnetic field device is configured and elaborated in detail, and a series of magnetic field simulations are further employed to analyze the variations in magnetic induction intensity within the polishing area induced by excitation current and working gap. In addition, RMRP experiments are conducted to evaluate how excitation current and working gap affect the final polishing results. The simulation results for the magnetic field device indicate that magnetic induction intensity in the polishing area is positively correlated with excitation current, yet negatively correlated with the working gap. When either the excitation current or the working gap is held constant, the magnetic induction intensity within the polishing area exhibits a non-monotonic trend of initial increase followed by decrease as radial distance increases. The RMRP experimental results demonstrate that at an excitation current of 4 A, the surface roughness of the specimen is reduced significantly, dropping from an initial 327 nm to a final 42 nm. Correspondingly, when the working gap is adjusted to 0.75 mm, the surface roughness of the specimen decreases from 322 to 41 nm.