Fast‐Response Broadband UV–NIR MSM Photodetector Based on Vertically Aligned MoS 2‐ x

ABSTRACT 2D material‐based photodetectors exhibiting broadband photoresponse, are of significant interest for a wide range of applications including optical detection, imaging, and night vision. This work presents a broadband MSM (metal‐semiconductor‐metal) photodetector operating from ultraviolet (UV) to near‐infrared (NIR) region based on vertically‐aligned MoS 2‐ x (VA‐MoS 2‐ x ) synthesized via magnetron sputtering. The vertically‐aligned structure improves the light absorption due to reduced reflection resulting in a high photoresponsivity of 335 mA W −1 at 950 nm under a low bias of 0.1 V, along with notable specific detectivity of the order of 10 11 Jones. The device exhibits fast response speed with rise and fall time of 50.03 and 88.03 µs, respectively, at NIR region with stable and consistent photoresponse over than 7000 cycles of switching operation. These findings underscore the potential of VA‐MoS 2‐ x as promising candidates for the development of fast‐response, broadband optoelectronic devices, particularly for NIR photodetection applications.

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Publication Details

Journal
Advanced Optical Materials
Published
2026-09-21
DOI
https://doi.org/10.1002/adom.71814
Primary Topic
2D Materials and Applications
Type
article
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article

Fast‐Response Broadband UV–NIR MSM Photodetector Based on Vertically Aligned MoS 2‐ x

Jyotisman Bora, Arup R. Pal, Anannya Bordoloi, Khomdram Bijoykumar Singh
Advanced Optical Materials
2D Materials and Applications
article

Fast‐Response Broadband UV–NIR MSM Photodetector Based on Vertically Aligned MoS 2‐ x

Jyotisman Bora, Arup R. Pal, Anannya Bordoloi, Khomdram Bijoykumar Singh
article en

Abstract

ABSTRACT 2D material‐based photodetectors exhibiting broadband photoresponse, are of significant interest for a wide range of applications including optical detection, imaging, and night vision. This work presents a broadband MSM (metal‐semiconductor‐metal) photodetector operating from ultraviolet (UV) to near‐infrared (NIR) region based on vertically‐aligned MoS 2‐ x (VA‐MoS 2‐ x ) synthesized via magnetron sputtering. The vertically‐aligned structure improves the light absorption due to reduced reflection resulting in a high photoresponsivity of 335 mA W −1 at 950 nm under a low bias of 0.1 V, along with notable specific detectivity of the order of 10 11 Jones. The device exhibits fast response speed with rise and fall time of 50.03 and 88.03 µs, respectively, at NIR region with stable and consistent photoresponse over than 7000 cycles of switching operation. These findings underscore the potential of VA‐MoS 2‐ x as promising candidates for the development of fast‐response, broadband optoelectronic devices, particularly for NIR photodetection applications.

Advanced Optical Materials
Indian Institute of Technology Bombay (IN), Institute of Advanced Study in Science and Technology (IN), Academy of Scientific and Innovative Research (IN)
Openalex Percentile: Top 24%
2D Materials and Applications
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