Nanoimprint lithography for scalable electronic and photonic nanomanufacturing

Abstract Nanoimprint lithography (NIL) has emerged as a powerful nanofabrication technology capable of bridging the gap between nanoscale precision and scalable manufacturing. Unlike conventional projection lithography, whose resolution is fundamentally constrained by diffraction and increasingly complex optical systems, NIL relies on direct mechanical replication of nanoscale patterns from a structured mold, enabling deterministic pattern transfer with sub-10 nm resolution. Over the past three decades, NIL has evolved from a laboratory-scale patterning concept into a technologically mature platform with growing industrial relevance across photonics, electronics, and large-area functional materials. This review provides a comprehensive overview of nanoimprint lithography, covering its historical development, technological evolution, material considerations, and emerging applications. By connecting NIL process mechanisms and material constraints with application-specific manufacturing requirements, this review provides a process-to-application perspective on scalable electronic and photonic nanomanufacturing. The fundamental principles and major NIL variants, including thermal NIL (T-NIL), ultraviolet NIL (UV-NIL), step-and-flash (S-FIL)/jet-and-flash (J-FIL) imprint lithography, and roll-to-roll NIL (R2R NIL), are systematically discussed with emphasis on process mechanisms, scalability, and manufacturing compatibility. Critical material considerations such as mold design, imprint resist properties, and substrate compatibility are also analyzed to elucidate the key parameters governing pattern fidelity, residual layer control, and process reliability. Particular attention is devoted to emerging application domains where NIL offers unique advantages, including nanophotonic metasurfaces, integrated silicon photonics, optoelectronic devices, and large-area optical structures. Recent demonstrations of high-efficiency metalenses, low-loss silicon photonic waveguides, and scalable flexible photonic components highlight the ability of NIL to combine subwavelength structural control with wafer-scale replication. As demands for advanced photonic integration and functional nanostructures continue to increase, nanoimprint lithography is increasingly recognized as a scalable manufacturing pathway capable of translating nanoscale device concepts into practical technologies.