Vibration‐Modulated Lock‐In Microscopy for High‐Sensitivity Nanodefect Detection
ABSTRACT Defect detection in precision manufacturing and semiconductor inspection is mainly hindered by camera noise, with mechanical vibrations often seen as disturbances that impair image quality. In this work, we challenge this typical perspective by transforming vibration from an unwanted noise source into a controllable stimulus that enhances defect signals. We introduce vibration‐modulated lock‐in microscopy (VLM), a detection technique that can be easily integrated into standard optical microscopes. By applying controlled pulsed vibrations, VLM shifts defect responses into specific frequency components, and phase‐locked analysis selectively extracts their amplitudes in the frequency domain. This approach effectively separates defect signals from background noise. Experimental results demonstrate that VLM offers high‐contrast, high‐resolution detection of otherwise hidden defects, outperforming traditional methods in both 2D surface detection and 3D subsurface imaging. By turning vibration from a limitation into a signal enhancement tool, this method opens new avenues for noise‐resistant optical measurement and defect detection.
Authors
- Jinlong Zhu (ORCID: https://orcid.org/0000-0002-4062-0963)
- Shuming Yang (ORCID: https://orcid.org/0000-0001-7685-537X)
- Shiyuan Liu (ORCID: https://orcid.org/0000-0002-0756-1439)
- Guofeng Zhang (ORCID: https://orcid.org/0000-0002-9030-0431)
- Xiangyu Zhao (ORCID: https://orcid.org/0009-0003-7844-1922)
Institutions
- Huazhong University of Science and Technology (CN)
- Xi'an Jiaotong University (CN)
Publication Details
- Journal
- Laser & Photonics Review
- Published
- 2026-09-21
- DOI
- https://doi.org/10.1002/lpor.71941
- Primary Topic
- Force Microscopy Techniques and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00