Hybrid Two‐Step Inkjet Printing and Dip‐Coating Enable Scalable 30%‐Efficient Perovskite/Silicon Tandem Solar Cells

ABSTRACT Fully scalable fabrication routes are one cornerstone required for commercial deployment of monolithic perovskite/silicon tandem solar cells. However, to date industrially viable deposition processes delivering high performance, uniform thin films, and compatibility with established silicon manufacturing remain limited. Here, we present a fully scalable deposition strategy for the entire perovskite top‑cell, including a dip‐coated self‑assembled monolayer hole‑transport layer, a hybrid two‐step inkjet‐printed wide‐bandgap perovskite absorber, and a dip‐coated interfacial passivation. The process shows excellent reproducibility and high device performance. When integrated with textured silicon bottom cells, the tandem solar cells achieve power conversion efficiencies exceeding 30%, highlighting the technological potential of this fabrication route. Scaling the perovskite active area by a factor of >120 results in a single‐junction module with an area of 12.96 cm 2 and an efficiency of 17.8%, corresponding to a loss of only 0.53% abs. per decade of area scaling. This highlights that our process not only delivers high performance tandem devices, but also offers excellent prospects for upscaling the device area. Extensive material analysis and device analysis substantiate the scalability, film quality, and interfacial control achieved. Importantly, this work provides the first demonstration of perovskite/silicon tandem solar cells surpassing 30% efficiency using an inkjet‑printing‐based perovskite absorber deposition.