Towards the Growth of Wafer Scale Single-Crystalline Two-Dimensional Semiconductors

Abstract Two-dimensional (2D) semiconductors are promising candidates for next-generation electronics owing to their atomically thin nature and superior electronic properties. Realizing this potential, however, requires wafer-scale single-crystalline films with high uniformity and low defect density. In this Perspective, we review recent progress in wafer-scale synthesis of single-crystalline 2D semiconductors via chemical vapor deposition (CVD). We discuss two major growth strategies: single-nucleus growth and unidirectional stitching growth, and summarize the fundamental thermodynamic and kinetic principles underlying nucleation suppression, epitaxial alignment, and seamless domain coalescence, alongside representative advances in implementing each strategy. Finally, we outline the key challenges and future opportunities in strategy integration, low-temperature and predictive growth, the scalable synthesis of p-type 2D semiconductors and heterostructures, and the transition from laboratory investigation toward industrial manufacturing.