Regulating Interfacial Recombination in Cd‐Free Sb 2 Se 3 Solar Cells via an Ultrathin Al 2 O 3 Layer
ABSTRACT Antimony selenide (Sb 2 Se 3 ) has emerged as a promising photovoltaic absorber owing to its suitable bandgap, high absorption coefficient, and low‐toxicity elemental composition. However, high‐efficiency Sb 2 Se 3 solar cells commonly rely on CdS electron‐transport layers, whereas Cd‐free alternatives often suffer from pronounced recombination losses at the Sb 2 Se 3 /buffer heterojunction. Herein, we introduce a sub‐nanometer atomic‐layer‐deposited aluminum oxide (Al 2 O 3 ) interlayer at the Sb 2 Se 3 /Zn x Sn 1‐x O heterojunction to improve its interfacial electronic quality. Spectroscopic and theoretical analyses indicate that the ultrathin Al 2 O 3 induces interfacial chemical interaction and charge redistribution, thereby modifying the local electronic structure and interfacial energetics. Complementary surface and device‐level measurements reveal a more homogeneous near‐surface electronic response, reduced field‐dependent carrier‐collection losses, and mitigated trap‐assisted recombination. Temperature‐dependent V OC measurements show an increase in the recombination activation energy from 0.910±0.018 to 1.045±0.021 eV, while intensity‐dependent V OC measurements reveal a decrease in the effective ideality factor from 1.37 to 1.21, consistently indicating a reduced contribution of trap‐assisted recombination, although interface‐related recombination remains an important loss pathway. Consequently, the optimized Sb 2 Se 3 /Al 2 O 3 /Zn x Sn 1‐x O device achieves a champion power conversion efficiency of 9.28% with an enhanced open‐circuit voltage. These results demonstrate that ultrathin Al 2 O 3 interfacial modification provides an effective strategy for mitigating recombination‐related losses in high‐performance Cd‐free Sb 2 Se 3 solar cells.
Authors
- Yaohua Mai (ORCID: https://orcid.org/0000-0002-3795-361X)
- Xiaoyang Liang (ORCID: https://orcid.org/0000-0002-0728-470X)
- Wei Dang (ORCID: https://orcid.org/0009-0007-8001-614X)
- Zhiqiang Li (ORCID: https://orcid.org/0000-0003-2835-5906)
- 李登润
- Li Zhang (ORCID: https://orcid.org/0000-0001-9203-2250)
- Zheng Zhang (ORCID: https://orcid.org/0000-0002-1568-2732)
- Haixu Liu (ORCID: https://orcid.org/0009-0007-8115-0826)
- Anming Mo (ORCID: https://orcid.org/0009-0000-9489-3142)
Institutions
- Jinan University (CN)
- Hebei University (CN)
Publication Details
- Journal
- Advanced Energy Materials
- Published
- 2026-09-17
- DOI
- https://doi.org/10.1002/aenm.71577
- Primary Topic
- Chalcogenide Semiconductor Thin Films
- Type
- article
- Field-Weighted Citation Impact
- 0.00