Structural design of photosensitive polyimide with aqueous development and low curing temperature
Photosensitive polyimide (PSPI) has attracted extensive attention in advanced packaging due to its excellent properties. It serves as a key material widely used in semiconductors, integrated circuits, and display devices. However, materials for advanced packaging are currently required not only to achieve low-temperature curing but also to rely on aqueous development for high resolution and reduced environmental hazards. Nevertheless, existing studies on photosensitive polyimides that adopt water-soluble polyimide for aqueous development to realize low-temperature curing still fail to meet the application requirements of advanced packaging.To this end, this study proposes a structural design strategy for polyimide that is soluble in both organic solvents and water. Combined with diazonaphthoquinone (DNQ), a photosensitive polyimide system is constructed to simultaneously achieve high resolution (2 μm) and low-temperature curing. The polyimide film can be fully cured at only 140°C while retaining the inherent excellent properties of polyimide.The dual-soluble (organic solvent/water) structural design strategy for photosensitive polyimide proposed in this work can not only solve the problem of low-temperature curing but also enable aqueous development.
Authors
- Haiquan Guo (ORCID: https://orcid.org/0000-0003-3574-4125)
- Shun Shi (ORCID: https://orcid.org/0009-0004-8259-7150)
- Tong Yuan
- Jiaojiao Ma
Institutions
- Chinese Academy of Sciences (CN)
- Changchun Institute of Applied Chemistry (CN)
Publication Details
- Journal
- High Performance Polymers
- Published
- 2026-08-25
- DOI
- https://doi.org/10.1177/09540083261480319
- Primary Topic
- Synthesis and properties of polymers
- Type
- article
- Field-Weighted Citation Impact
- 0.00