A Transparent, High Refractive Index and Abbe Number Polymer for Visible Metalens by High Fidelity Nanoimprinting

ABSTRACT Simultaneously achieving high visible transparency, high refractive index ( n ), and a large Abbe number ( υ D ) in organic polymers remains a fundamental challenge. Here, a facile and efficient dual sulfur‐mediated Michael addition strategy is reported to synthesize transparent high refractive index polymers (HRIPs) with large υ D . By combining main backbone de‐conjugation to preserve visible transparency with rational side‐chain engineering for n ‐tuning, the optimal polymer (H4) achieves an ultrahigh n of 1.86 at 589 nm alongside a large υ D of 34.93 and robust stability. Moreover, polymer H4 exhibits remarkable performance in nanoimprint lithography, replicating features down to 75 nm with aspect ratios up to 8.5 and a low volumetric shrinkage of only 3.23%. Notably, a nanoimprinted metalens prototype fabricated from H4 delivers a relative focusing efficiency of 49.8% at 550 nm (NA = 0.5), approaching the theoretical design value (52.94%). Therefore, the high refractive index polymer H4 bridges molecular design and manufacturable meta‐optics, showing tremendous potential in scalable, flexible, next‐generation photonic platforms by translating side‐chain polarizability engineering into practical wavefront control.

Authors

Institutions

Publication Details

Journal
Advanced Materials
Published
2026-08-25
DOI
https://doi.org/10.1002/adma.74791
Primary Topic
Synthesis and properties of polymers
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
article

A Transparent, High Refractive Index and Abbe Number Polymer for Visible Metalens by High Fidelity Nanoimprinting

Siqi Liu, Yuanyuan Cheng, Shiyang Shao, Yuanda Liu et al.
Advanced Materials
Synthesis and properties of polymers
article

A Transparent, High Refractive Index and Abbe Number Polymer for Visible Metalens by High Fidelity Nanoimprinting

Siqi Liu, Yuanyuan Cheng, Shiyang Shao, Yuanda Liu, Jun Hu, Ziyu Wang, Chaobin He, Hongbin Chen, Jianrong Guo, Binting Huang, Fangfang Huang, Ji chao Fu
article en

Abstract

ABSTRACT Simultaneously achieving high visible transparency, high refractive index ( n ), and a large Abbe number ( υ D ) in organic polymers remains a fundamental challenge. Here, a facile and efficient dual sulfur‐mediated Michael addition strategy is reported to synthesize transparent high refractive index polymers (HRIPs) with large υ D . By combining main backbone de‐conjugation to preserve visible transparency with rational side‐chain engineering for n ‐tuning, the optimal polymer (H4) achieves an ultrahigh n of 1.86 at 589 nm alongside a large υ D of 34.93 and robust stability. Moreover, polymer H4 exhibits remarkable performance in nanoimprint lithography, replicating features down to 75 nm with aspect ratios up to 8.5 and a low volumetric shrinkage of only 3.23%. Notably, a nanoimprinted metalens prototype fabricated from H4 delivers a relative focusing efficiency of 49.8% at 550 nm (NA = 0.5), approaching the theoretical design value (52.94%). Therefore, the high refractive index polymer H4 bridges molecular design and manufacturable meta‐optics, showing tremendous potential in scalable, flexible, next‐generation photonic platforms by translating side‐chain polarizability engineering into practical wavefront control.

Advanced Materials
Agency for Science, Technology and Research (SG), National University of Singapore (SG), Hainan University (CN), Institute of Materials Research and Engineering (SG)
Openalex Percentile: Top 21%
Synthesis and properties of polymers
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.