Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication

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Publication Details

Journal
Scilight
Published
2026-08-25
DOI
https://doi.org/10.1063/10.0046481
Primary Topic
Nanowire Synthesis and Applications
Type
article
Field-Weighted Citation Impact
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article

Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication

Ben Ikenson
Scilight
Nanowire Synthesis and Applications
article

Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication

Ben Ikenson
article en

Abstract

No abstract available for this paper.
ScilightVol. 2026(35)
Openalex Percentile: Top 19%
Nanowire Synthesis and Applications
DOISourceOpenAlex
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Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication — Ben Ikenson · Scilight (2026) | TGRS Research Map | TGRS