Experimental determination of electron and hole impact ionization coefficients in GaN avalanche photodiodes

In this study, we experimentally determined the impact ionization coefficients of GaN using p–i–n avalanche photodiodes with a hybrid mesa structure. Single-carrier-type initiation was achieved using two optical-window configurations based on the same hybrid-mesa p–i–n architecture, enabling p-side illumination for electron injection and n-side illumination for hole injection. The electron and hole impact ionization coefficients were obtained as α (E) = 2.22 × 106 exp(−1.64 × 107/E) cm−1 and β (E) = 1.58 × 105 exp(−3.29 × 106/E) cm−1, respectively, over the electric field range from 2.2 to 2.8 MV/cm. The results show that the impact ionization coefficient of holes is substantially greater than that of electrons (β/α > 10 at 2.5 MV/cm), indicating the advantage of hole-initiated avalanche multiplication for GaN-based avalanche photodiodes.

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Publication Details

Journal
Applied Physics Letters
Published
2026-08-24
DOI
https://doi.org/10.1063/5.0340806
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

Experimental determination of electron and hole impact ionization coefficients in GaN avalanche photodiodes

Dunjun Chen, Hai Lu, Haifan You, Haiping Wang et al.
Applied Physics Letters
GaN-based semiconductor devices and materials
article

Experimental determination of electron and hole impact ionization coefficients in GaN avalanche photodiodes

Dunjun Chen, Hai Lu, Haifan You, Haiping Wang, Xuzhi Zhao, Zhan Ma, Rong Zhang, Jiandong Ye, Bin Liu, Feiyu Zhang, Youdou Zheng
article en

Abstract

In this study, we experimentally determined the impact ionization coefficients of GaN using p–i–n avalanche photodiodes with a hybrid mesa structure. Single-carrier-type initiation was achieved using two optical-window configurations based on the same hybrid-mesa p–i–n architecture, enabling p-side illumination for electron injection and n-side illumination for hole injection. The electron and hole impact ionization coefficients were obtained as α (E) = 2.22 × 106 exp(−1.64 × 107/E) cm−1 and β (E) = 1.58 × 105 exp(−3.29 × 106/E) cm−1, respectively, over the electric field range from 2.2 to 2.8 MV/cm. The results show that the impact ionization coefficient of holes is substantially greater than that of electrons (β/α > 10 at 2.5 MV/cm), indicating the advantage of hole-initiated avalanche multiplication for GaN-based avalanche photodiodes.

Applied Physics LettersVol. 129(8)
Nanjing Institute of Technology (CN), Nanjing University (CN)
Openalex Percentile: Top 14%
GaN-based semiconductor devices and materials
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