Immersion lithography in wafer scanning

Multiphase flow dynamics in immersion lithography govern the yield and defect density of semiconductor manufacturing.

Authors

Publication Details

Journal
Scilight
Published
2026-08-21
DOI
https://doi.org/10.1063/10.0046362
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
Field-Weighted Citation Impact
0.00
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article

Immersion lithography in wafer scanning

Katherine De Lange
Scilight
Nanofabrication and Lithography Techniques
article

Immersion lithography in wafer scanning

Katherine De Lange
article en

Abstract

Multiphase flow dynamics in immersion lithography govern the yield and defect density of semiconductor manufacturing.

ScilightVol. 2026(34)
Openalex Percentile: Top 18%
Nanofabrication and Lithography Techniques
DOISourceOpenAlex
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Immersion lithography in wafer scanning — Katherine De Lange · Scilight (2026) | TGRS Research Map | TGRS