Radiation-Induced Charge Trapping Effect in BST/AlGaN/GaN Transistor: Gamma-Ray Dosimeter

Abstract Reliable gamma-ray dosimetry across nuclear, medical, space, and defense environments demands sensing platforms that combine radiation hardness with sensitive electrical transduction and real-time readout capability. This work reports a solid-state gamma-ray dosimeter based on a two-terminal AlGaN/GaN high-electron-mobility transistor (HEMT) functionalized with a sputtered barium strontium titanate (Ba0.5Sr0.5TiO3, BST) dielectric layer. The AlGaN/GaN HEMT was evaluated for radiation hardness up to 10 Gy, with no measurable change in saturation current or threshold voltage, thereby establishing it as a stable electrostatic transducer. The BST layer, deposited over the gate region, served as the radiation-sensitive medium: gamma irradiation generates electron-hole pairs and donor-type oxygen-vacancy-related defects in the BST, and preferential electron capture at these defects and interface states leaves a net negative trapped charge. This net negative charge modulates the surface potential at the BST/AlGaN interface, progressively depleting the 2DEG and reducing the drain current in proportion to the absorbed dose. Dose-dependent transfer characteristics of the device confirm the mechanism: the drain current decreases and saturates with dose while the transconductance is progressively suppressed, indicating a net negative trapped charge that both depletes and scatters the 2DEG channel. High-resolution XPS shows that the near-surface BST is chemically and structurally intact under irradiation-the A-site (Ba, Sr) core levels and the Ti oxidation state are invariant. Grazing-incidence XRD confirms that the perovskite lattice is preserved over the full dose range. BST thicknesses of 50 to 200 nm were evaluated; the 100 nm configuration yielded the optimal response, reflecting a balance between the total trap population and the charge-to-interface electrostatic coupling efficiency. Six independently fabricated devices exhibit a consistent, monotonic drain-current response over 0–10 Gy, with ≤±6% inter-device variation, and a quasi-linear sensitivity of ∼25%/Gy below 2 Gy, extending to ∼7.5 Gy. A machine-learning dose-prediction pipeline, validated via leave-one-device-out cross-validation, complements a simple calibration baseline. System-level integration with a hardware-differential sensing architecture and an edge-computing IoT module enables cumulative dosimetry with continuous real-time wireless readout at ∼200 ms latency and ∼300 mW power consumption, bridging lab-scale radiation sensing and field-deployable dosimetry.

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Publication Details

Journal
ACS Applied Electronic Materials
Published
2026-08-20
DOI
https://doi.org/10.1021/acsaelm.6c01298
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.00

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article

Radiation-Induced Charge Trapping Effect in BST/AlGaN/GaN Transistor: Gamma-Ray Dosimeter

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ACS Applied Electronic Materials
GaN-based semiconductor devices and materials
article

Radiation-Induced Charge Trapping Effect in BST/AlGaN/GaN Transistor: Gamma-Ray Dosimeter

S. Tripathy, Satyajit Sahu, Naresh Jingar, Surendra Singh Barala, Ankur Gupta, Mahesh Kumar, Vikas Kumar Pandey, Pradeep Kumar, Chaitanya B. Auti, Vishal Gupta
article en

Abstract

Abstract Reliable gamma-ray dosimetry across nuclear, medical, space, and defense environments demands sensing platforms that combine radiation hardness with sensitive electrical transduction and real-time readout capability. This work reports a solid-state gamma-ray dosimeter based on a two-terminal AlGaN/GaN high-electron-mobility transistor (HEMT) functionalized with a sputtered barium strontium titanate (Ba0.5Sr0.5TiO3, BST) dielectric layer. The AlGaN/GaN HEMT was evaluated for radiation hardness up to 10 Gy, with no measurable change in saturation current or threshold voltage, thereby establishing it as a stable electrostatic transducer. The BST layer, deposited over the gate region, served as the radiation-sensitive medium: gamma irradiation generates electron-hole pairs and donor-type oxygen-vacancy-related defects in the BST, and preferential electron capture at these defects and interface states leaves a net negative trapped charge. This net negative charge modulates the surface potential at the BST/AlGaN interface, progressively depleting the 2DEG and reducing the drain current in proportion to the absorbed dose. Dose-dependent transfer characteristics of the device confirm the mechanism: the drain current decreases and saturates with dose while the transconductance is progressively suppressed, indicating a net negative trapped charge that both depletes and scatters the 2DEG channel. High-resolution XPS shows that the near-surface BST is chemically and structurally intact under irradiation-the A-site (Ba, Sr) core levels and the Ti oxidation state are invariant. Grazing-incidence XRD confirms that the perovskite lattice is preserved over the full dose range. BST thicknesses of 50 to 200 nm were evaluated; the 100 nm configuration yielded the optimal response, reflecting a balance between the total trap population and the charge-to-interface electrostatic coupling efficiency. Six independently fabricated devices exhibit a consistent, monotonic drain-current response over 0–10 Gy, with ≤±6% inter-device variation, and a quasi-linear sensitivity of ∼25%/Gy below 2 Gy, extending to ∼7.5 Gy. A machine-learning dose-prediction pipeline, validated via leave-one-device-out cross-validation, complements a simple calibration baseline. System-level integration with a hardware-differential sensing architecture and an edge-computing IoT module enables cumulative dosimetry with continuous real-time wireless readout at ∼200 ms latency and ∼300 mW power consumption, bridging lab-scale radiation sensing and field-deployable dosimetry.

ACS Applied Electronic Materials
Agency for Science, Technology and Research (SG), Defence Science and Technology Group (AU), Indian Institute of Technology Jodhpur (IN), Indian Institute of Technology Mandi (IN)
Defence Research and Development Organisation, Ministry of Education, India
Openalex Percentile: Top 14%
GaN-based semiconductor devices and materials
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