Dielectric-Induced Charge Doping in Monolayer MoS2

Abstract Unintentional doping from dielectrics can impact the electronic properties of two-dimensional transition metal dichalcogenide (2D TMD) semiconductors. Our recent work shows that high-dielectric-constant (k) ZrO2 is an electrostatically inert dielectric for 2D MoS2, supported by X-ray spectroscopy (XPS) and electrical measurements. Here, we expand this work through gate-controlled photoluminescence (PL) of monolayer MoS2 placed on different substrates. MoS2 on ZrO2 exhibits a low carrier concentration, indicated by a small trion-to-exciton ratio (X–/X0) of 0.5, similar to those on high-quality hBN. At a high electrostatic doping of ∼1013 cm–2, MoS2 on high-k ZrO2 reveals a slight exponential dependence of X–/X0 versus carrier concentration, while MoS2 on SiO2 shows strong exponential characteristics even at low gating (1012 cm–2) due to substantial electron doping from substrate-induced disorder tail states. Our findings provide insights into the doping mechanisms in industry-compatible amorphous dielectrics and evaluate their potential for scalable optoelectronic devices.

Authors

Institutions

Publication Details

Journal
Nano Letters
Published
2026-08-20
DOI
https://doi.org/10.1021/acs.nanolett.6c03443
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

Funders

Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Dielectric-Induced Charge Doping in Monolayer MoS2

Kamal Kumar Paul, Takashi Taniguchi, Kenji Watanabe, Leyi Loh et al.
Nano Letters
2D Materials and Applications
article

Dielectric-Induced Charge Doping in Monolayer MoS2

Kamal Kumar Paul, Takashi Taniguchi, Kenji Watanabe, Leyi Loh, Manish Chhowalla, Mauro Brotons‐Gisbert, Deepnarayan Biswas, Lixin Liu, Han Yan, Esther Lilian Gray, Tien-Lin Lee, Yuan Chen, Han Yan
article en

Abstract

Abstract Unintentional doping from dielectrics can impact the electronic properties of two-dimensional transition metal dichalcogenide (2D TMD) semiconductors. Our recent work shows that high-dielectric-constant (k) ZrO2 is an electrostatically inert dielectric for 2D MoS2, supported by X-ray spectroscopy (XPS) and electrical measurements. Here, we expand this work through gate-controlled photoluminescence (PL) of monolayer MoS2 placed on different substrates. MoS2 on ZrO2 exhibits a low carrier concentration, indicated by a small trion-to-exciton ratio (X–/X0) of 0.5, similar to those on high-quality hBN. At a high electrostatic doping of ∼1013 cm–2, MoS2 on high-k ZrO2 reveals a slight exponential dependence of X–/X0 versus carrier concentration, while MoS2 on SiO2 shows strong exponential characteristics even at low gating (1012 cm–2) due to substantial electron doping from substrate-induced disorder tail states. Our findings provide insights into the doping mechanisms in industry-compatible amorphous dielectrics and evaluate their potential for scalable optoelectronic devices.

Nano Letters
National Institute for Materials Science (JP), University of Cambridge (GB), Diamond Light Source (GB), Heriot-Watt University Malaysia (MY), The Faraday Institution (GB)
Faraday Institution, Royal Academy of Engineering, Royal Society, Ministry of Education, Culture, Sports, Science and Technology, Engineering and Physical Sciences Research Council, European Research Council, Japan Society for the Promotion of Science, Core Research for Evolutional Science and Technology, HORIZON EUROPE Marie Sklodowska-Curie Actions
Industry, innovation and infrastructure
Openalex Percentile: Top 21%
2D Materials and Applications
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.