Microscopic evolution mechanism of streamer-like pulses in silicon needle corona discharge based on plasma chemistry
Under negative DC corona with a silicon needle cathode, the discharge phenomenon differs markedly from that of metal electrodes, producing “streamer-like pulses” that exhibit significant randomness. To elucidate the formation mechanism, a two-dimensional axisymmetric pin–plate discharge model based on plasma chemical reactions was established to systematically investigate the kinetic processes and microscopic mechanisms of the silicon needle corona discharge. Compared with small-amplitude pulses, the formation of streamer-like pulses involves substantially higher electron density, electric field intensity, and ion density. The electron distribution is localized within 0.1 mm in front of the needle tip, with a pronounced electric field depression occurring in the region 0.01 − 0.1 mm from the tip. Ion composition analysis reveals that at the peak of small pulses, the dominant positive ions are O4+ and O2+, and negative ions are primarily O2−, whereas at the peak of streamer-like pulses, N4+ and O2+ become the dominant positive ions. Surface conductivity modulates the discharge mode: low conductivity gives large amplitude disparity, whereas high conductivity yields uniform pulses. Although photoionization is enhanced during streamer-like pulses, collisional ionization remains the main source of electron multiplication. This study reveals the synergistic regulation mechanism of silicon needle surface properties and space charge on discharge modes, providing a theoretical basis for understanding corona discharge behaviors on semiconductor electrodes.
Authors
- Xuandong Liu (ORCID: https://orcid.org/0000-0002-9079-243X)
- Xueyang Bai (ORCID: https://orcid.org/0000-0001-7749-545X)
- Minjie Li (ORCID: https://orcid.org/0009-0004-2595-4713)
- Yanyi Wang (ORCID: https://orcid.org/0009-0006-6060-8204)
- Zihan Yuan (ORCID: https://orcid.org/0009-0008-3872-5409)
- Yong Chen
Institutions
- National Supercomputing Center in Wuxi (CN)
- Wuxi Institute of Technology (CN)
- Xi'an Jiaotong University (CN)
Publication Details
- Journal
- Journal of Applied Physics
- Published
- 2026-08-17
- DOI
- https://doi.org/10.1063/5.0343090
- Primary Topic
- Plasma Applications and Diagnostics
- Type
- article
- Field-Weighted Citation Impact
- 0.00