UV and EB nanoimprint lithography — the 3Dresyns NMF photoresist family
This white paper covers UV and electron-beam nanoimprint lithography through the 3Dresyns NMF photoresist family, including stamp, resist and nano/micro fabrication routes. NIL performance depends on resist viscosity, curing route, demoulding, pattern fidelity, shrinkage, adhesion and stamp compatibility. The NMF family is positioned as a nano/micro fabrication material system.
Authors
- Juan Segurola
Institutions
- Dynavax Technologies (Germany) (DE)
Publication Details
- Journal
- Zenodo (CERN European Organization for Nuclear Research)
- Published
- 2026-08-21
- DOI
- https://doi.org/10.5281/zenodo.21973720
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00