A Dual‐Branch Flux‐Based Extended Memristor Model With Machine‐Learning‐Assisted Calibration

ABSTRACT Resistive switching devices based on complex oxide heterostructures exhibit rich, history‐dependent electrical responses arising from polarity‐selective transport mechanisms, defect dynamics, and interfacial phenomena. Accurately capturing these nonlinear behaviors remains a major challenge for predictive device modeling and for the reliable design of large‐scale memristive systems. Here, we introduce a dual‐branch, flux‐controlled extended memristor model that provides a physically interpretable asymmetric conduction in multilayer Au/HfO x /Al 2 O 3 /TiO 2 /TiN devices. The model is calibrated and validated against experimental current–voltage characteristics measured on laboratory‐fabricated devices. The approach decomposes the device memductance into two polarity‐activated branches that reproduce the distinct forward and reverse transport regimes, while embedding flux as the internal state variable governing long‐term evolution and hysteresis shaping. A hybrid machine‐learning calibration pipeline—combining Latin Hypercube Sampling, Bayesian Optimization, and gradient‐based refinement—enables robust parameter identification directly from current–voltage experimental measurements, ensuring quantitative agreement across a broad range of time‐ and frequency‐dependent excitations. The resulting model captures key physical signatures such as lobe asymmetry, history dependence, and flux accumulation, providing a unified framework suitable for device characterization, circuit‐level simulation, and neuromorphic hardware design. Owing to its modular structure and physical consistency, the methodology can be readily extended to other classes of resistive switching materials and memory devices.

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Publication Details

Journal
Advanced Electronic Materials
Published
2026-08-03
DOI
https://doi.org/10.1002/aelm.70498
Primary Topic
Advanced Memory and Neural Computing
Type
article
Field-Weighted Citation Impact
0.00

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article

A Dual‐Branch Flux‐Based Extended Memristor Model With Machine‐Learning‐Assisted Calibration

Ronald Tetzlaff, Fernando Corinto, Alon Ascoli, K. E. Nikiruy et al.
Advanced Electronic Materials
Advanced Memory and Neural Computing
article

A Dual‐Branch Flux‐Based Extended Memristor Model With Machine‐Learning‐Assisted Calibration

Ronald Tetzlaff, Fernando Corinto, Alon Ascoli, K. E. Nikiruy, Ahmet Şamil Demirkol, Davide Rossetti, M. Ziegler
article en

Abstract

ABSTRACT Resistive switching devices based on complex oxide heterostructures exhibit rich, history‐dependent electrical responses arising from polarity‐selective transport mechanisms, defect dynamics, and interfacial phenomena. Accurately capturing these nonlinear behaviors remains a major challenge for predictive device modeling and for the reliable design of large‐scale memristive systems. Here, we introduce a dual‐branch, flux‐controlled extended memristor model that provides a physically interpretable asymmetric conduction in multilayer Au/HfO x /Al 2 O 3 /TiO 2 /TiN devices. The model is calibrated and validated against experimental current–voltage characteristics measured on laboratory‐fabricated devices. The approach decomposes the device memductance into two polarity‐activated branches that reproduce the distinct forward and reverse transport regimes, while embedding flux as the internal state variable governing long‐term evolution and hysteresis shaping. A hybrid machine‐learning calibration pipeline—combining Latin Hypercube Sampling, Bayesian Optimization, and gradient‐based refinement—enables robust parameter identification directly from current–voltage experimental measurements, ensuring quantitative agreement across a broad range of time‐ and frequency‐dependent excitations. The resulting model captures key physical signatures such as lobe asymmetry, history dependence, and flux accumulation, providing a unified framework suitable for device characterization, circuit‐level simulation, and neuromorphic hardware design. Owing to its modular structure and physical consistency, the methodology can be readily extended to other classes of resistive switching materials and memory devices.

Advanced Electronic Materials
Politecnico di Torino (IT), Advanced Materials and Devices (United States) (US), Technische Universität Dresden (DE)
Politecnico di Torino
Openalex Percentile: Top 17%
Advanced Memory and Neural Computing
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