Breaking the Size‐Tolerance Trade‐off in Vertical Couplers via Adjoint‐Based Inverse Design

ABSTRACT Heterogeneous integration of III–V lasers on silicon is pivotal for scaling next‐generation photonic systems, yet it faces a fundamental bottleneck: the inherent trade‐off between coupler compactness and misalignment tolerance. In this work, we break this longstanding barrier by combining multi‐start adjoint optimization with a physics‐guided strategy that places dense control points in near‐phase‐matched regions. This approach produces a more extended phase‐near‐matched region that spatially overlaps with the region of controlled odd supermode excitation, which is the key condition for simultaneously achieving compactness and tolerance. Our design achieves 98.11% coupling efficiency within a footprint of just 20 μm. Remarkably, it sustains over 80% efficiency under substantial misalignments up to ± 1.1 μm and waveguide width variations of ± 0.4 μm—representing the highest tolerance per unit length reported for vertical III–V‐on‐silicon couplers. This achievement decouples the traditional conflict between size and robustness, offering a critical solution for high‐yield micro‐transfer printing and dense photonic integration. The successful extension of our optimization framework to the lithium niobate‐on‐silicon nitride platform confirms its generality, positioning it as a versatile and transformative design strategy for a broad range of heterogeneous photonic platforms.

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Publication Details

Journal
Nanophotonics
Published
2026-07-28
DOI
https://doi.org/10.1002/nap2.70211
Primary Topic
Photonic and Optical Devices
Type
article
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article

Breaking the Size‐Tolerance Trade‐off in Vertical Couplers via Adjoint‐Based Inverse Design

Shiyu Mei, Zeqiu Liu, Yulian Cao, Suo Wang et al.
Nanophotonics
Photonic and Optical Devices
article

Breaking the Size‐Tolerance Trade‐off in Vertical Couplers via Adjoint‐Based Inverse Design

Shiyu Mei, Zeqiu Liu, Yulian Cao, Suo Wang, Jianguo Liu, Jiahui Chi, Haiyang Yu, Ruiqi Liu
article en

Abstract

ABSTRACT Heterogeneous integration of III–V lasers on silicon is pivotal for scaling next‐generation photonic systems, yet it faces a fundamental bottleneck: the inherent trade‐off between coupler compactness and misalignment tolerance. In this work, we break this longstanding barrier by combining multi‐start adjoint optimization with a physics‐guided strategy that places dense control points in near‐phase‐matched regions. This approach produces a more extended phase‐near‐matched region that spatially overlaps with the region of controlled odd supermode excitation, which is the key condition for simultaneously achieving compactness and tolerance. Our design achieves 98.11% coupling efficiency within a footprint of just 20 μm. Remarkably, it sustains over 80% efficiency under substantial misalignments up to ± 1.1 μm and waveguide width variations of ± 0.4 μm—representing the highest tolerance per unit length reported for vertical III–V‐on‐silicon couplers. This achievement decouples the traditional conflict between size and robustness, offering a critical solution for high‐yield micro‐transfer printing and dense photonic integration. The successful extension of our optimization framework to the lithium niobate‐on‐silicon nitride platform confirms its generality, positioning it as a versatile and transformative design strategy for a broad range of heterogeneous photonic platforms.

NanophotonicsVol. 15(15)
State Key Laboratory on Integrated Optoelectronics (CN), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN)
Openalex Percentile: Top 15%
Photonic and Optical Devices
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