Gate-tunable mid-infrared electroluminescence from Te/MoS2 p-n heterojunctions

Abstract Mid-infrared (MIR) emitters are critical components in advanced photonic systems, driving progress in fields such as chemical sensing, environmental monitoring, medical diagnostics, thermal imaging and free-space communications. Conventional MIR emitters based on III–V heterostructures rely on complex epitaxial growth on rigid lattice-matched substrates and suffer from limited integration compatibility with CMOS or flexible platforms. Recent MIR emitters based on two-dimensional (2D) materials such as black phosphorus (BP) is more suitable for on-chip applications but faces challenges related to stability and emission efficiency. Based on the recently discovered highly efficient photoluminescence of Te, we demonstrate a gate-tunable mid-infrared light-emitting diode based on a van der Waals heterojunction formed by multilayer transition metal dichalcogenide (TMD) MoS 2 and tellurium (Te). The device emits polarized electroluminescence (EL) centered at 3.5 μm under forward bias at 25 K, and the EL persists up to 80 K with reduced intensity. Gate control of the MoS 2 Fermi level modulates the band alignment and injection efficiency, enabling dynamic tuning of the EL intensity. The emission remains spectrally stable under varying bias and gating, indicating robust band-edge recombination. These results establish the Te/TMD heterostructure as a promising platform for integrated polarized mid-infrared optoelectronics.

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Publication Details

Journal
Light Science & Applications
Published
2026-07-27
DOI
https://doi.org/10.1038/s41377-026-02402-6
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

Gate-tunable mid-infrared electroluminescence from Te/MoS2 p-n heterojunctions

Jinluo Cheng, Dong Sun, S F Chen, Anlian Pan et al.
Light Science & Applications
2D Materials and Applications
article

Gate-tunable mid-infrared electroluminescence from Te/MoS2 p-n heterojunctions

Jinluo Cheng, Dong Sun, S F Chen, Anlian Pan, Delang Liang, Shiyu Wang, Zhi Zheng, Mingyang Qin, Changgan Zeng, Jie Sheng, Yuchun Chen, Lin Li
article en

Abstract

Abstract Mid-infrared (MIR) emitters are critical components in advanced photonic systems, driving progress in fields such as chemical sensing, environmental monitoring, medical diagnostics, thermal imaging and free-space communications. Conventional MIR emitters based on III–V heterostructures rely on complex epitaxial growth on rigid lattice-matched substrates and suffer from limited integration compatibility with CMOS or flexible platforms. Recent MIR emitters based on two-dimensional (2D) materials such as black phosphorus (BP) is more suitable for on-chip applications but faces challenges related to stability and emission efficiency. Based on the recently discovered highly efficient photoluminescence of Te, we demonstrate a gate-tunable mid-infrared light-emitting diode based on a van der Waals heterojunction formed by multilayer transition metal dichalcogenide (TMD) MoS 2 and tellurium (Te). The device emits polarized electroluminescence (EL) centered at 3.5 μm under forward bias at 25 K, and the EL persists up to 80 K with reduced intensity. Gate control of the MoS 2 Fermi level modulates the band alignment and injection efficiency, enabling dynamic tuning of the EL intensity. The emission remains spectrally stable under varying bias and gating, indicating robust band-edge recombination. These results establish the Te/TMD heterostructure as a promising platform for integrated polarized mid-infrared optoelectronics.

Light Science & ApplicationsVol. 15(1)
University of Science and Technology of China (CN), Zhongyuan University of Technology (CN), Hunan University (CN), Hunan Normal University (CN), Peking University (CN), Zhengzhou University of Light Industry (CN), Changsha Normal University (CN), Changchun Institute of Optics, Fine Mechanics and Physics (CN), Collaborative Innovation Center of Quantum Matter (CN), Peking University International Hospital (CN)
National Natural Science Foundation of China, National Key Research and Development Program of China
Openalex Percentile: Top 20%
2D Materials and Applications
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