Persistence of Large and Gate-Tunable Anisotropic Magnetoresistance in an Atomically Thin Antiferromagnet

Anisotropic magnetoresistance (AMR) offers a robust electrical readout of antiferromagnetic (AFM) states, playing a central role in the rapidly advancing field of AFM spintronics. Despite its great versatility, electrical probing of the Néel vector via AMR remains challenging in the ultrathin limit due to interface disorder and reduced dimensionality. Here, we demonstrate electrical readout of the Néel vector down to 1.3 nm (two layers) in the two-dimensional van der Waals (vdW) AFM semiconductor NiPS 3 . Leveraging spin-flop-mediated rotation of the Néel vector and using both transistor and tunnel-junction device geometries, we identify two distinct AMR contributions in NiPS 3, which dominate at low and high charge densities, respectively. We achieve full gate control over these contributions, enabling tunability of both the magnitude and sign of magnetoresistance. Our results establish semiconducting vdW antiferromagnets as a rich platform for studying AMR in the ultrathin limit, opening new avenues for multifunctional AFM spintronic devices.

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Publication Details

Journal
Nano Letters
Published
2026-07-22
DOI
https://doi.org/10.1021/acs.nanolett.6c01905
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
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article

Persistence of Large and Gate-Tunable Anisotropic Magnetoresistance in an Atomically Thin Antiferromagnet

Dmitry Lebedev, Alberto F. Morpurgo, Takashi Taniguchi, Kenji Watanabe et al.
Nano Letters
2D Materials and Applications
article

Persistence of Large and Gate-Tunable Anisotropic Magnetoresistance in an Atomically Thin Antiferromagnet

Dmitry Lebedev, Alberto F. Morpurgo, Takashi Taniguchi, Kenji Watanabe, Cheol-Yeon Cheon
article en

Abstract

Anisotropic magnetoresistance (AMR) offers a robust electrical readout of antiferromagnetic (AFM) states, playing a central role in the rapidly advancing field of AFM spintronics. Despite its great versatility, electrical probing of the Néel vector via AMR remains challenging in the ultrathin limit due to interface disorder and reduced dimensionality. Here, we demonstrate electrical readout of the Néel vector down to 1.3 nm (two layers) in the two-dimensional van der Waals (vdW) AFM semiconductor NiPS 3 . Leveraging spin-flop-mediated rotation of the Néel vector and using both transistor and tunnel-junction device geometries, we identify two distinct AMR contributions in NiPS 3, which dominate at low and high charge densities, respectively. We achieve full gate control over these contributions, enabling tunability of both the magnitude and sign of magnetoresistance. Our results establish semiconducting vdW antiferromagnets as a rich platform for studying AMR in the ultrathin limit, opening new avenues for multifunctional AFM spintronic devices.

Nano Letters
University of Geneva (CH), National Institute for Materials Science (JP)
Openalex Percentile: Top 18%
2D Materials and Applications
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Persistence of Large and Gate-Tunable Anisotropic Magnetoresistance in an Atomically Thin Antiferromagnet — Dmitry Lebedev, Alberto F. Morpurgo, et al. · Nano Letters (2026) | TGRS Research Map | TGRS