Sensor Quality Control and annealing studies of HGCAL silicon sensors

We summarise Sensor Quality Control (SQC) results of non-irradiated silicon sensors for the CMS HGCAL detector, as well as the first detailed annealing campaign with a wafer-scale 120 µm (Epitaxial) sensor exposed to 2 × 10$^{15}$ n$_{eq}$/cm$^2$ at the Rhode Island Nuclear Science Center (RINSC). For the non-irradiated sensors, we present an overview of the QC workflow developed for HGCAL, including automated handling of vendor data, validation of electrical measurements, and cross-checking of wafer-level characteristics. The study investigates, for the first time, the isothermal annealing behaviour at 60 °C after annealing periods ranging from 10 to 5000 minutes. Hamburg-model parameters for effective doping concentration changes with annealing time, extracted from full-sensor data, are presented. The post-irradiation behaviour of sensors with hot regions in the pre-irradiation leakage current measurements, as well as epitaxial sensors with stacking faults in individual cells, is also investigated.

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Publication Details

Journal
KITopen
Published
2026-07-22
DOI
https://doi.org/10.5445/ir/1000195388
Primary Topic
Particle Detector Development and Performance
Type
article
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article

Sensor Quality Control and annealing studies of HGCAL silicon sensors

CMS HGCAL group, Gizem Gul Dincer
KITopen
Particle Detector Development and Performance
article

Sensor Quality Control and annealing studies of HGCAL silicon sensors

CMS HGCAL group, Gizem Gul Dincer
article en

Abstract

We summarise Sensor Quality Control (SQC) results of non-irradiated silicon sensors for the CMS HGCAL detector, as well as the first detailed annealing campaign with a wafer-scale 120 µm (Epitaxial) sensor exposed to 2 × 10$^{15}$ n$_{eq}$/cm$^2$ at the Rhode Island Nuclear Science Center (RINSC). For the non-irradiated sensors, we present an overview of the QC workflow developed for HGCAL, including automated handling of vendor data, validation of electrical measurements, and cross-checking of wafer-level characteristics. The study investigates, for the first time, the isothermal annealing behaviour at 60 °C after annealing periods ranging from 10 to 5000 minutes. Hamburg-model parameters for effective doping concentration changes with annealing time, extracted from full-sensor data, are presented. The post-irradiation behaviour of sensors with hot regions in the pre-irradiation leakage current measurements, as well as epitaxial sensors with stacking faults in individual cells, is also investigated.

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