Electrical transport in ultra-thin films: from Fuchs–Sondheimer to quantum confinement

Ultra-thin films are fundamental components of modern nanoelectronics, where reducing thickness to the few-nanometer scale leads to a dramatic increase in electrical resistivity. For decades, this behavior has been interpreted in terms of classical size effects, primarily surface scattering within the Fuchs–Sondheimer theory and grain-boundary scattering in the Mayadas–Shatzkes model. While these approaches successfully describe transport when the film thickness is comparable to the electronic mean free path, growing experimental evidence indicates that they become insufficient under extreme confinement. This review discusses the crossover from classical scattering to a quantum-confinement regime in which the electronic states available for transport are fundamentally restructured by finite size. We review the recently proposed reciprocal-space confinement theory, which predicts an exponential increase of resistivity with decreasing thickness at the nanoscale, and discuss how it can be combined with classical surface-scattering models to provide a unified description of ultra-thin metallic and semiconducting films. Finally, we summarize recent experimental evidence supporting this picture and discuss its implications for future nanoelectronic devices, nanoscale interconnects, and quantum transport under extreme spatial confinement.