A Fast-Response LDO Based on High-Temperature 0.18 μm SOI Technology

To meet the requirements of wide-temperature reliability and fast transient response in power management ICs for automotive, aerospace, and industrial applications, this paper presents a fast-response low-dropout regulator (LDO) based on a 0.18 μm high-temperature SOI process. Benefiting from the buried oxide isolation structure of the SOI technology, leakage current and parasitic effects under high-temperature conditions are effectively suppressed. The proposed LDO employs an NMOS power transistor, with an on-chip charge pump used to enhance the gate driving capability. In addition, a triple-loop regulation scheme consisting of a main negative feedback loop, an auxiliary positive feedback loop, and a current-mode feedback loop is adopted to improve transient performance and enhance loop stability. The fabricated chip occupies an area of 2840 μm × 1490 μm and supports an input voltage range of 3–5.5 V and an output voltage range of 1.2–3.3 V. Over a temperature range of −55 °C to 175 °C, the LDO can deliver a maximum load current of 400 mA. At 175 °C, the measured overshoot and undershoot voltages are 64 mV and 94 mV, respectively, with a maximum recovery time of 336 μs. Moreover, the power supply rejection ratio (PSRR) reaches 56.8 dB at 100 Hz. Experimental results demonstrate that the proposed LDO exhibits excellent high-temperature adaptability, strong load-driving capability, and superior transient response performance.

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Publication Details

Journal
Electronic Materials
Published
2026-07-01
DOI
https://doi.org/10.3390/electronicmat7030016
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.00

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article

A Fast-Response LDO Based on High-Temperature 0.18 μm SOI Technology

Yufei Huang, Sixian Li, Caiping Zheng, Chengying Chen et al.
Electronic Materials
Silicon Carbide Semiconductor Technologies
article

A Fast-Response LDO Based on High-Temperature 0.18 μm SOI Technology

Yufei Huang, Sixian Li, Caiping Zheng, Chengying Chen, Muhammad Yasir Faheem, Qiaoying Gan
article en

Abstract

To meet the requirements of wide-temperature reliability and fast transient response in power management ICs for automotive, aerospace, and industrial applications, this paper presents a fast-response low-dropout regulator (LDO) based on a 0.18 μm high-temperature SOI process. Benefiting from the buried oxide isolation structure of the SOI technology, leakage current and parasitic effects under high-temperature conditions are effectively suppressed. The proposed LDO employs an NMOS power transistor, with an on-chip charge pump used to enhance the gate driving capability. In addition, a triple-loop regulation scheme consisting of a main negative feedback loop, an auxiliary positive feedback loop, and a current-mode feedback loop is adopted to improve transient performance and enhance loop stability. The fabricated chip occupies an area of 2840 μm × 1490 μm and supports an input voltage range of 3–5.5 V and an output voltage range of 1.2–3.3 V. Over a temperature range of −55 °C to 175 °C, the LDO can deliver a maximum load current of 400 mA. At 175 °C, the measured overshoot and undershoot voltages are 64 mV and 94 mV, respectively, with a maximum recovery time of 336 μs. Moreover, the power supply rejection ratio (PSRR) reaches 56.8 dB at 100 Hz. Experimental results demonstrate that the proposed LDO exhibits excellent high-temperature adaptability, strong load-driving capability, and superior transient response performance.

Electronic MaterialsVol. 7(3)
Beijing Institute of Technology (CN), COMSATS University Islamabad (PK), Xiamen University of Technology (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 12%
Silicon Carbide Semiconductor Technologies
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