Formation of Nanostructures on a Ti:sapphire Surface Irradiated by Femtosecond Laser Pulses and the Influence on Reflection Reduction

We measured the femtosecond laser ablation threshold of Ti:sapphire, which may be important for forming nanostructures with a femtosecond laser (515 nm, 150 fs, 5 kHz). An ablation threshold of 1.51 J/cm2 at 1000 pulses for Ti:sapphire was estimated from the laser fluence dependence of the crater diameter. A nanostructure was produced on the Ti:sapphire surface below the ablation threshold fluence. The nanostructures caused a reflection reduction of 2.0% at a wavelength of 400 nm, which agreed well with the calculation for a root mean square surface roughness of 100 nm.

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Publication Details

Journal
IEEJ Transactions on Fundamentals and Materials
Published
2026-06-30
DOI
https://doi.org/10.1541/ieejfms.146.274
Primary Topic
Laser Material Processing Techniques
Type
article
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article

Formation of Nanostructures on a Ti:sapphire Surface Irradiated by Femtosecond Laser Pulses and the Influence on Reflection Reduction

Masaki Hashida, Satoru Iwamori, Mitsuhiro Kusaba, Yasuhiro Miyasaka et al.
IEEJ Transactions on Fundamentals and Materials
Laser Material Processing Techniques
article

Formation of Nanostructures on a Ti:sapphire Surface Irradiated by Femtosecond Laser Pulses and the Influence on Reflection Reduction

Masaki Hashida, Satoru Iwamori, Mitsuhiro Kusaba, Yasuhiro Miyasaka, Takayasu Nishimoto
article en

Abstract

We measured the femtosecond laser ablation threshold of Ti:sapphire, which may be important for forming nanostructures with a femtosecond laser (515 nm, 150 fs, 5 kHz). An ablation threshold of 1.51 J/cm2 at 1000 pulses for Ti:sapphire was estimated from the laser fluence dependence of the crater diameter. A nanostructure was produced on the Ti:sapphire surface below the ablation threshold fluence. The nanostructures caused a reflection reduction of 2.0% at a wavelength of 400 nm, which agreed well with the calculation for a root mean square surface roughness of 100 nm.

IEEJ Transactions on Fundamentals and MaterialsVol. 146(7)
Tokai University (JP), Osaka Sangyo University (JP), Kyoto University (JP), Kai Research (United States) (US), National Institutes for Quantum Science and Technology (JP), Instituto de Investigaciones Químicas (ES)
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Laser Material Processing Techniques
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