Scalable Fabrication of 4 nm Silicon Nanopores by Self-Limiting Metal-Assisted Chemical Etching Combined with Optical Process Control

High Resolution Image Download MS PowerPoint Slide Solid-state nanopores in ultrathin (<20 nm) membranes enable label-free single-molecule sensing, but their adoption as sensors is limited by the lack of scalable manufacturing methods that deliver nanopores with single-nanometer reproducibility. Self-limiting metal-assisted chemical etching (MACE) in silicon-on-insulator (SOI) membranes offers a parallel wet-chemical route for nanopore fabrication, yet prior demonstrations lacked a predictive design rule and required electron microscopy or electrical tests for confirming presence and number of pores. Here, we convert self-limiting MACE into a manufacturing-oriented workflow with optical process control to obtain and verify the formation of 4 nm nanopores in a scalable fashion. We decouple the deposition of 200 ± 10 nm gold (Au) nanoparticles from etching, enabling independent optimization of the two steps. The nanoparticle size allows for particle-per-membrane counting by dark-field optical microscopy, so that deposition can be repeated when counts are below target. We then map etching behavior across Au nanoparticle diameter d (10–200 nm) and silicon (Si) device-layer thickness t (5–18 nm), finding that d / t ≥ 0.8 ratio predicts self-limiting MACE behavior, where pore diameter becomes independent of particle size. In this regime, 200 ± 10 nm catalysts yield 4 ± 1 nm pores, corresponding to a reduction of ∼50× in pore diameter and ∼10× in pore-diameter variability compared to the catalyst diameter and related variability. Successful through-membrane pore formation produces undercuts in the buried oxide (typically ∼200–300 nm diameter) beneath each pore, which can be characterized for each membrane by bright-field microscopy and used as a proxy for the otherwise optically invisible 4 nm pores. Together, the predictive d / t framework and two-stage optical verification establish a scalable wet-chemical route to fabricate nanopores for biomolecular sensing and related nanofluidic devices.

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Publication Details

Journal
Langmuir
Published
2026-06-25
DOI
https://doi.org/10.1021/acs.langmuir.6c00975
Primary Topic
Nanopore and Nanochannel Transport Studies
Type
article
Field-Weighted Citation Impact
0.00

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article

Scalable Fabrication of 4 nm Silicon Nanopores by Self-Limiting Metal-Assisted Chemical Etching Combined with Optical Process Control

Göran Stemme, Valentina Leva, Anna Herland, Fabio De Ferrari et al.
Langmuir
Nanopore and Nanochannel Transport Studies
article

Scalable Fabrication of 4 nm Silicon Nanopores by Self-Limiting Metal-Assisted Chemical Etching Combined with Optical Process Control

Göran Stemme, Valentina Leva, Anna Herland, Fabio De Ferrari, Alessandro Enrico, Shyamprasad N. Raja, Frank Niklaus
article en

Abstract

High Resolution Image Download MS PowerPoint Slide Solid-state nanopores in ultrathin (<20 nm) membranes enable label-free single-molecule sensing, but their adoption as sensors is limited by the lack of scalable manufacturing methods that deliver nanopores with single-nanometer reproducibility. Self-limiting metal-assisted chemical etching (MACE) in silicon-on-insulator (SOI) membranes offers a parallel wet-chemical route for nanopore fabrication, yet prior demonstrations lacked a predictive design rule and required electron microscopy or electrical tests for confirming presence and number of pores. Here, we convert self-limiting MACE into a manufacturing-oriented workflow with optical process control to obtain and verify the formation of 4 nm nanopores in a scalable fashion. We decouple the deposition of 200 ± 10 nm gold (Au) nanoparticles from etching, enabling independent optimization of the two steps. The nanoparticle size allows for particle-per-membrane counting by dark-field optical microscopy, so that deposition can be repeated when counts are below target. We then map etching behavior across Au nanoparticle diameter d (10–200 nm) and silicon (Si) device-layer thickness t (5–18 nm), finding that d / t ≥ 0.8 ratio predicts self-limiting MACE behavior, where pore diameter becomes independent of particle size. In this regime, 200 ± 10 nm catalysts yield 4 ± 1 nm pores, corresponding to a reduction of ∼50× in pore diameter and ∼10× in pore-diameter variability compared to the catalyst diameter and related variability. Successful through-membrane pore formation produces undercuts in the buried oxide (typically ∼200–300 nm diameter) beneath each pore, which can be characterized for each membrane by bright-field microscopy and used as a proxy for the otherwise optically invisible 4 nm pores. Together, the predictive d / t framework and two-stage optical verification establish a scalable wet-chemical route to fabricate nanopores for biomolecular sensing and related nanofluidic devices.

Langmuir
University of Pavia (IT), Science for Life Laboratory (SE), Karolinska Institutet (SE), Integrated Oncology (United States) (US), KTH Royal Institute of Technology (SE)
Knut och Alice Wallenbergs Stiftelse, Stiftelsen för Strategisk Forskning
Openalex Percentile: Top 12%
Nanopore and Nanochannel Transport Studies
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