Remote CF <sub>4</sub> Plasma Fluorination of Graphene for Low-Damage Spin–Orbit Engineering
C-F functionalization while minimizing vacancy formation. Nonlocal transport measurements show that the nonlocal resistance increases in fluorinated graphene and decays exponentially with channel length, consistent with spin diffusion and yielding a spin relaxation length of ∼0.4 μm. Within the Elliott-Yafet framework, we estimate an effective SOC energy scale of 4-9 meV. These results provide a Raman-validated, tunable process route for enhancing SOC in graphene while suppressing vacancy damage.
Authors
- Gil‐Ho Lee (ORCID: https://orcid.org/0000-0002-7619-8979)
- Hee Cheul Choi (ORCID: https://orcid.org/0000-0003-1002-1262)
- Seong Jang (ORCID: https://orcid.org/0000-0002-6089-7513)
- Seung-Hyun Shin
- Changmin Choi (ORCID: https://orcid.org/0009-0008-6874-6358)
- Chae-Gun Lee
Institutions
- Pohang University of Science and Technology (KR)
- Korea Post (KR)
Publication Details
- Journal
- Nano Letters
- Published
- 2026-06-16
- DOI
- https://doi.org/10.1021/acs.nanolett.6c01475
- Primary Topic
- Plasma Diagnostics and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00
Funders
- National Research Foundation of Korea
- Samsung
- Institute for Information and Communications Technology Promotion