Investigating Interfacial Coupling in Janus XP <sub>3</sub> -Based 2D Heterostructures for Photocatalytic Redox Processes
High Resolution Image Download MS PowerPoint Slide Understanding and controlling interfacial electronic coupling in two-dimensional (2D) heterostructures is essential for designing materials with suitable band-edge alignment, efficient charge separation, and enhanced photocatalytic redox activity. Here, we investigate vertical heterobilayers constructed from two distinct XP 3 monolayers (X = Ge, Sb, Bi, Sn, Al, Ga, and Pb) using first-principles density functional theory. The resulting Janus heterobilayers are energetically favorable and elastically stable, with electronic band gaps ranging from metallic and near-metallic to semiconducting regimes. The interfacial coupling is discussed in terms of physically motivated descriptor-based trends, including metal–metal interlayer distance, vertical interlayer separation, electron localization at the midpoint of the interfacial metal–metal contact, Bader charge redistribution, and integrated crystal orbital Hamilton population (ICOHP)-derived bonding contributions. To rationalize these effects, we identify distinct coupling regimes spanning van der Waals (vdW)-dominated, intermediate hybridized, and partially covalent interfacial regimes. Optical absorption calculations indicate visible-to-near-infrared activity in selected systems, and band-edge alignment identifies potential candidates for selective redox processes. This work provides a physically grounded understanding of interfacial coupling in XP 3 heterostructures and offers practical guidelines for tuning their electronic structure, charge separation behavior, and redox functionality within this material family.
Authors
- Dominike Pacine de Andrade Deus (ORCID: https://orcid.org/0000-0003-0330-7318)
- Elisangela da Silva Barboza (ORCID: https://orcid.org/0000-0002-7874-3344)
- T. A. S. Pereira (ORCID: https://orcid.org/0000-0001-7968-9194)
- Igor S. S. de Oliveira (ORCID: https://orcid.org/0000-0002-9121-9598)
- Erika N. Lima (ORCID: https://orcid.org/0000-0002-0670-9737)
Institutions
- Universidade Federal de Lavras (BR)
- Universidade Federal de Mato Grosso (BR)
- Instituto Federal de Educação, Ciência e Tecnologia do Triângulo Mineiro (BR)
- Instituto de Física La Plata (AR)
Publication Details
- Journal
- ACS Applied Nano Materials
- Published
- 2026-06-16
- DOI
- https://doi.org/10.1021/acsanm.6c01493
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00